Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | FGFR4 | P22455 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Acrylic Acid SCHEMBL27750286 | 0.91 | LMNA (0.42) | ALDH1A1TSHRFGFR4LMNA | |
| SCHEMBL7719309 | 0.80 | — | — | |
| SCHEMBL27726693 | 0.79 | ALDH1A1 (0.32) | ALDH1A1 | |
| SCHEMBL27477831 | 0.79 | LMNA (0.33) | ALDH1A1TSHRLMNA | |
| SCHEMBL1199933 | 0.72 | — | — | |
| Acrylic Acid SCHEMBL28456927 | 0.71 | LMNA (0.46) | ALDH1A1TSHRFGFR4LMNAHSD17B10 | |
| SCHEMBL27400839 | 0.71 | ALDH1A1 (0.42) | ALDH1A1TSHR | |
| Ethylene SCHEMBL28215909 | 0.70 | DGAT1 (0.44) | ALDH1A1LMNAHSD17B10 | |
| Allylamine SCHEMBL4894416 | 0.70 | ALDH1A1 (0.39) | ALDH1A1TSHRFGFR4LMNAHSD17B10 | |
| SCHEMBL11602378 | 0.70 | HTT (0.35) | ALDH1A1TSHRFGFR4LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-102822264-A | Radiation curable insulation composition | EQUISTAR CHEM LP | 2012-12-12 | — | — | CN | disclosed |
| CN-101410418-B | Process for preparing acrylate copolymers | BASF SE | 2011-11-09 | — | — | CN | disclosed |
| CN-101410418-A | Process for preparing acrylate copolymers | BASF SE (DE) | 2009-04-15 | — | — | CN | disclosed |
| CN-101405304-A | Method for producing polymers in aqueous solvents | BASF SE (DE) | 2009-04-08 | — | — | CN | disclosed |
| US-5658672-A | BLEND OF A URETHANE POLYACRYLATE COMPOUND, A URETHANE DIACRYLATE OR DIVINYL COMPOUND, ONE OR MORE ADHESION PROMOTERS AND ETHYLENICALLY UNSATURATED COPOLYMERIZABLE MONOMERS; ONE-PART; SOLVENT-FREE | GENCORP INC. (US) | 1997-08-19 | — | — | US | disclosed |
| EP-0311566-B1 | THERMOTROPIC BIPHILIC HYDROGELS AND HYDROPLASTICS | CIBA-GEIGY AG (CH) | 1993-03-24 | — | — | EP | disclosed |
| US-5147923-A | Water-swellable random copolymers of N, N-dimethylacrylamide and (cyclo)aliphatic or aromatic acrylic esters having low cloud points | CIBA-GEIGY CORPORATION (US) | 1992-09-15 | — | — | US | disclosed |
| US-5104954-A | Swellable random copolymers of N,N-dimethylacrylamide and acrylic esters having reversible cloud points; for heat activated sunscreens | CIBA-GEIGY CORPORATION (US) | 1992-04-14 | — | — | US | disclosed |
| US-5057560-A | Thermotropic copolymer hydrogels from N,N-dimethylacrylamide and methoxy-ethyl (meth) acrylate | CIBA-GEIGY CORPORATION (US) | 1991-10-15 | — | — | US | disclosed |
| US-4929494-A | METALLIC FOIL LAMINATES FOR ELECTRONICS | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1990-05-29 | — | — | US | disclosed |
| EP-0311566-A2 | Thermotropic biphilic hydrogels and hydroplastics | CIBA-GEIGY AG (CH) | 1989-04-12 | — | — | EP | disclosed |
| EP-0266775-A2 | Laminates | SHOWA DENKO KABUSHIKI KAISHA (JP) | 1988-05-11 | — | — | EP | disclosed |
| US-4288526-A | Light-sensitive printing plates with discontinuous over-coating | FUJI PHOTO FILM CO., LTD. (JP) | 1981-09-08 | — | — | US | disclosed |
| US-4268611-A | Contact photographic process for producing a planographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1981-05-19 | — | — | US | disclosed |
| US-4251620-A | PROVIDING A REMOVABLE, UNEVEN COATING BY USING A GRAVURE ROLL | FUJI PHOTO FILM CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4216289-A | Process for the production of printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1980-08-05 | — | — | US | disclosed |
| US-4168979-A | Light-sensitive printing plate with matt overlayer | FUJI PHOTO FILM CO., LTD. (JP) | 1979-09-25 | — | — | US | disclosed |
| US-4126460-A | Light sensitive printing plate comprising a matted overlayer | FUJI PHOTO FILM CO., LTD. (JP) | 1978-11-21 | — | — | US | disclosed |
| US-4119617-A | Curable resinous composition comprising an unsaturated cycloacetal compound and a polythiol compound | SHOWA HIGHPOLYMER CO., LTD. (JP) | 1978-10-10 | — | — | US | disclosed |