Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4539307 | 0.99 | — | — | |
| SCHEMBL892908 | 0.78 | — | — | |
| SCHEMBL7893053 | 0.71 | — | — | |
| SCHEMBL7513032 | 0.70 | ALDH1A1 (0.32) | ALDH1A1L3MBTL1 | |
| SCHEMBL3663210 | 0.68 | — | — | |
| SCHEMBL3205701 | 0.68 | TSHR (0.35) | — | |
| SCHEMBL893127 | 0.64 | USP2 (0.31) | — | |
| SCHEMBL6259575 | 0.63 | ACLY (0.33) | ALDH1A1 | |
| SCHEMBL14176515 | 0.63 | TSHR (0.36) | — | |
| SCHEMBL6725199 | 0.62 | CA4 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9754806-B2 | Apparatus for treating wafers using supercritical fluid | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-09-05 | — | — | US | disclosed |
| US-20150162221-A1 | APPARATUS FOR TREATING WAFERS USING SUPERCRITICAL FLUID | LEE HYO-SAN (KR) | 2015-06-11 | — | — | US | disclosed |
| US-8585917-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-19 | — | — | US | disclosed |
| US-20120080059-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-05 | — | — | US | disclosed |
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | disclosed |
| US-7857939-B2 | Apparatus for treating wafers using supercritical fluid | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2010-12-28 | — | — | US | disclosed |
| US-20080029159-A1 | Apparatus and method for treating wafers using supercritical fluid | SAMSUNG ELECTRONICS CO., LTD. | 2008-02-07 | — | — | US | disclosed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | disclosed |
| US-7002044-B2 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | THE UNIVERSITY OF CONNECTICUT (US) | 2006-02-21 | — | — | US | disclosed |
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | CONNECTICUT, THE UNIVERSITY OF | 2004-05-20 | — | — | US | disclosed |
| US-6183945-B1 | COLOR FASTNESS; STABILITY OF IMAGE; STORAGE STABILITY; ADAPTABILITY TO RAPID PHOTOPROCESSING | KONICA CORPORATION (JP) | 2001-02-06 | — | — | US | disclosed |
| EP-1001309-A1 | Silver halide photographic light sensitive material and image forming method using thereof | KONICA CORPORATION (JP) | 2000-05-17 | — | — | EP | disclosed |
| US-6033831-A | FORMING AN IMAGE BY EXPOSING A PHOTOGRAPHIC IMAGE FORMING MEDIUM BY SCANNING BY A LIGHT BEAM. | KONICA CORPORATION | 2000-03-07 | — | — | US | disclosed |
| EP-0814375-B1 | Image forming method | KONISHIROKU PHOTO IND (JP) | 1999-12-08 | — | — | EP | disclosed |
| EP-0952484-A2 | Method for forming an image | KONICA CORPORATION (JP) | 1999-10-27 | — | — | EP | disclosed |
| US-5837430-A | LIGHT EXPOSURE A SILVER HALIDE EMULSION ON A SUPPORTS, AMPLIFYING DEVELOPMENT WITH A LOW CONCENTRATION SILVER CHLORIDE CONTENT IN EACH YELLOW, MAGENTA AND CYAN IMAGE FORMING LAYERS | KONICA CORPORATION (JP) | 1998-11-17 | — | — | US | disclosed |
| EP-0814375-A1 | Image forming method | KONICA CORPORATION (JP) | 1997-12-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | MGAM, NSFL1C, LIPA | ALDH1A1 4041/4885L3MBTL1 2934/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.