SCHEMBL8962832

SCHEMBL8962832

Brc1ccc(B(Oc2ccccc2)Oc2ccccc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.42
TDP1 Q9NUW8 1/20 0.42
MAPK1 P28482 1/20 0.41
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
TSHR P16473 2/20 0.39
CYP2A6 P11509 2/20 0.35
LTA4H P09960 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
CA5A P35218 1/20 0.33
CA5B Q9Y2D0 1/20 0.33
NPC1 O15118 1/20 0.33
RAB9A P51151 1/20 0.33
MCL1 Q07820 2/20 0.33
MAOB P27338 3/20 0.32
HTR2A P28223 1/20 0.32
CA4 P22748 1/20 0.32
PTGS2 P35354 1/20 0.32
IDO1 P14902 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL734634 0.84 CA4 (0.46) ALDH1A1TDP1MAPK1CA1CA2
SCHEMBL14983380 0.80 CA1 (0.48) ALDH1A1TDP1MAPK1CA1CA2
SCHEMBL14983366 0.78 MAOA (0.52) ALDH1A1TDP1CA1CA2TSHR
SCHEMBL14983346 0.78 ORAI1 (0.48) TDP1CA1CA2TSHRCYP2A6
SCHEMBL14983344 0.78 ORAI1 (0.39) TDP1CA1CA2TSHRCYP2A6
SCHEMBL14983334 0.78 ACHE (0.42) ALDH1A1TDP1CA1CA2TSHR
SCHEMBL14983501 0.77 CA4 (0.58) ALDH1A1TDP1CA1CA2CYP2A6
SCHEMBL29243113 0.76 CA4 (0.39) CA1CA2TSHRLTA4HCA5A
SCHEMBL29113661 0.75 TRPV6 (0.46) ALDH1A1TDP1MAPK1CA1CA2
SCHEMBL14983457 0.74 NOTUM (0.41) MAPK1CA1CA2TSHRLTA4H

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2599818-B1 Silicon-containing resist underlayer film-forming composition and patterning process SHINETSU CHEMICAL CO (JP) 2017-02-01 EP disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
US-8945820-B2 Silicon-containing resist underlayer film-forming composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-02-03 US disclosed
EP-2599818-A1 Silicon-containing resist underlayer film-forming composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2013-06-05 EP disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
US-20130137271-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-05-30 US disclosed
EP-0692033-A1 ENHANCEMENT OF CHEMILUMINESCENT REACTIONS BTG INTERNATIONAL LIMITED (GB) 1996-01-17 EP disclosed
WO-1994023060-A2 ENHANCEMENT OF CHEMILUMINESCENT REACTIONS BRITISH TECHNOLOGY GROUP LIMITED (GB) 1994-10-13 WO disclosed