Methacrylic Acid

Methacrylic Acid

SCHEMBL8964995

C=C(C(=O)O)C(C1=CC=CC1)C1=CC=CC1.C=C(C)C(=O)O.C=C(C)C(=O)OCC1CO1.C=C(C)C(=O)Oc1ccc(C(=O)C=Cc2ccc(C)cc2)cc1

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAOB P27338 11/20 0.39
MAOA P21397 4/20 0.37
ALDH1A1 P00352 2/20 0.36
MAPT P10636 4/20 0.35
MGLL Q99685 1/20 0.34
CYP1B1 Q16678 1/20 0.33
CYP3A4 P08684 1/20 0.33
HPGD P15428 1/20 0.33
RAB9A P51151 2/20 0.33
POLB P06746 1/20 0.33
NPC1 O15118 1/20 0.33
KMT2A Q03164 1/20 0.33
NFKB1 P19838 1/20 0.32
NFKB2 Q00653 1/20 0.32
RELA Q04206 1/20 0.32
ABCG2 Q9UNQ0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8965877 0.78 MAOB (0.40) MAOBMAOAALDH1A1MAPTMGLL
SCHEMBL10954435 0.73 MAOB (0.66) MAOBMAOAALDH1A1MAPTCYP1B1
SCHEMBL8964941 0.73 MAOB (0.66) MAOBMAOAALDH1A1MAPTCYP1B1
SCHEMBL8964946 0.73 MAOB (0.66) MAOBMAOAALDH1A1MAPTCYP1B1
SCHEMBL10954426 0.73 MAOB (0.66) MAOBMAOAALDH1A1MAPTCYP1B1
Methacrylic Acid SCHEMBL8965245 0.73 TNFRSF1A (0.43) ALDH1A1MAPTRAB9AKMT2ANFKB1
SCHEMBL8965834 0.70 TNFRSF1A (0.45) ALDH1A1MAPTRAB9AKMT2ANFKB1
SCHEMBL8965374 0.69 F3 (0.44) MAOBMAOAALDH1A1MAPTCYP1B1
SCHEMBL20550280 0.69 F3 (0.62) MAOBMAOAALDH1A1MAPTCYP1B1
SCHEMBL20802027 0.69 F3 (0.62) MAOBMAOAALDH1A1MAPTCYP1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed