SCHEMBL8965374

SCHEMBL8965374

C=C(C)C(=O)OC(C)(C)C.C=C(C)C(=O)OCC1CO1.C=CC(=O)Oc1ccc(C(=O)C=Cc2ccc(OC)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 2/20 0.44
BCHE P06276 2/20 0.42
MAOB P27338 8/20 0.42
MAPT P10636 6/20 0.41
ALDH1A1 P00352 4/20 0.41
MAOA P21397 3/20 0.41
XDH P47989 2/20 0.41
MEN1 O00255 2/20 0.41
KMT2A Q03164 2/20 0.41
P4HB P07237 1/20 0.41
CALM1 P0DP23 1/20 0.41
RAB9A P51151 1/20 0.41
CYP1B1 Q16678 2/20 0.41
CYP1A1 P04798 1/20 0.41
LMNA P02545 3/20 0.41
NPC1 O15118 1/20 0.41
HSPD1 P10809 1/20 0.40
TNFRSF1A P19438 1/20 0.40
HSPE1 P61604 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965834 0.84 TNFRSF1A (0.45) MAPTALDH1A1MEN1KMT2ARAB9A
Methacrylic Acid SCHEMBL8965210 0.84 F3 (0.39) F3BCHEMAOBMAPTALDH1A1
Methacrylic Acid SCHEMBL8965245 0.82 TNFRSF1A (0.43) MAPTALDH1A1MEN1KMT2ARAB9A
Methacrylic Acid SCHEMBL8965877 0.78 MAOB (0.40) BCHEMAOBMAPTALDH1A1MAOA
Methacrylic Acid SCHEMBL8965253 0.75 ALDH1A1 (0.45) MAPTALDH1A1MEN1KMT2ARAB9A
SCHEMBL3440624 0.74 MAOB (0.67) F3BCHEMAOBMAPTALDH1A1
SCHEMBL3440623 0.74 MAOB (0.67) F3BCHEMAOBMAPTALDH1A1
SCHEMBL6330060 0.74 F3 (0.73) F3BCHEMAOBMAPTALDH1A1
SCHEMBL10954169 0.74 F3 (0.73) F3BCHEMAOBMAPTALDH1A1
SCHEMBL10954163 0.74 F3 (0.73) F3BCHEMAOBMAPTALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed