Methacrylic Acid

Methacrylic Acid

SCHEMBL8965877

C=C(C)C(=O)O.C=C(C)C(=O)OCC1CO1.C=C(C)C(=O)OCCCCCC.C=CC(=O)Oc1ccc(C(=O)C=Cc2ccc(C)cc2)cc1

nearest known ligand 0.40

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Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
MAOB P27338 2/20 0.40
ABCG2 Q9UNQ0 1/20 0.39
BCHE P06276 9/20 0.39
ACHE P22303 7/20 0.39
POLB P06746 1/20 0.38
APEX1 P27695 1/20 0.38
HTT P42858 1/20 0.38
TDP1 Q9NUW8 1/20 0.38
MAOA P21397 1/20 0.38
ESR1 P03372 1/20 0.37
ALDH1A1 P00352 1/20 0.37
MGLL Q99685 1/20 0.37
TSHR P16473 2/20 0.36
MAPT P10636 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8965245 0.82 TNFRSF1A (0.43) ABCG2ALDH1A1MAPT
SCHEMBL8965834 0.79 TNFRSF1A (0.45) ABCG2ALDH1A1MAPT
SCHEMBL8965374 0.78 F3 (0.44) MAOBBCHEMAOAALDH1A1MAPT
Methacrylic Acid SCHEMBL8964995 0.78 MAOB (0.39) MAOBABCG2POLBMAOAALDH1A1
Methacrylic Acid SCHEMBL8965210 0.77 F3 (0.39) MAOBBCHEPOLBMAOAALDH1A1
SCHEMBL13592327 0.77 MAOB (0.61) MAOBABCG2BCHEACHEPOLB
Methacrylic Acid SCHEMBL4814817 0.75 ALDH1A1 (0.59) POLBAPEX1HTTTDP1ALDH1A1
SCHEMBL1499202 0.74 ALDH1A1 (0.61) TDP1ALDH1A1TSHR
SCHEMBL11093313 0.74 ALDH1A1 (0.61) TDP1ALDH1A1TSHR
SCHEMBL2767645 0.74 ALDH1A1 (0.50) BCHEACHEPOLBAPEX1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed