SCHEMBL8965834

SCHEMBL8965834

C=C(C)C(=O)OCC1CO1.C=CC(=O)Oc1ccc(C(=O)C=Cc2ccc(OC)c(C)c2)cc1

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TNFRSF1A P19438 2/20 0.45
MAPT P10636 4/20 0.43
KDM4E B2RXH2 2/20 0.43
LMNA P02545 2/20 0.43
ABCG2 Q9UNQ0 3/20 0.43
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
ALDH1A1 P00352 2/20 0.42
RECQL P46063 1/20 0.42
RAB9A P51151 1/20 0.41
CXCL12 P48061 2/20 0.41
MAPK1 P28482 1/20 0.40
NFKB1 P19838 4/20 0.40
NFKB2 Q00653 4/20 0.40
RELA Q04206 4/20 0.40
CA1 P00915 1/20 0.40
CA2 P00918 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methacrylic Acid SCHEMBL8965245 0.98 TNFRSF1A (0.43) TNFRSF1AMAPTKDM4ELMNAABCG2
SCHEMBL8965374 0.84 F3 (0.44) TNFRSF1AMAPTLMNAMEN1KMT2A
SCHEMBL8965410 0.84 TNFRSF1A (0.62) TNFRSF1AMAPTKDM4ELMNAABCG2
SCHEMBL8965407 0.84 TNFRSF1A (0.62) TNFRSF1AMAPTKDM4ELMNAABCG2
SCHEMBL30467144 0.84 TNFRSF1A (0.62) TNFRSF1AMAPTKDM4ELMNAABCG2
Methacrylic Acid SCHEMBL8965877 0.79 MAOB (0.40) MAPTABCG2ALDH1A1
Methacrylic Acid SCHEMBL8965210 0.79 F3 (0.39) TNFRSF1AMAPTLMNAMEN1KMT2A
SCHEMBL4725650 0.76 TNFRSF1A (0.76) TNFRSF1AMAPTKDM4ELMNAABCG2
SCHEMBL3440517 0.74 MAPT (0.70) TNFRSF1AMAPTKDM4ELMNAABCG2
SCHEMBL3440518 0.74 MAPT (0.70) TNFRSF1AMAPTKDM4ELMNAABCG2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed