SCHEMBL8965121

SCHEMBL8965121

C=Cc1ccc(C(=O)C=Cc2ccc(OC)c(Cc3ccccc3)c2[N+](=O)[O-])cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 4/20 0.43
MAPT P10636 4/20 0.43
RAB9A P51151 3/20 0.43
LMNA P02545 2/20 0.43
BCHE P06276 2/20 0.43
CAPN1 P07384 1/20 0.43
CTSL P07711 1/20 0.43
CTSB P07858 1/20 0.43
ABCG2 Q9UNQ0 4/20 0.42
ALDH1A1 P00352 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
MAOB P27338 5/20 0.41
KRAS P01116 1/20 0.41
MAOA P21397 1/20 0.41
TNFRSF1A P19438 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
ABCB1 P08183 1/20 0.41
CYP1A2 P05177 1/20 0.40
CYP3A4 P08684 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965265 0.89 CTSL (0.55) NPC1MAPTRAB9ALMNABCHE
SCHEMBL8965267 0.89 CTSL (0.55) NPC1MAPTRAB9ALMNABCHE
SCHEMBL8977029 0.78 MAPT (0.53) NPC1MAPTRAB9ALMNACAPN1
SCHEMBL8977026 0.78 MAPT (0.53) NPC1MAPTRAB9ALMNACAPN1
SCHEMBL8965131 0.73 MAPT (0.74) NPC1MAPTRAB9ALMNABCHE
SCHEMBL8965702 0.70 MAOB (0.74) NPC1MAPTRAB9ALMNABCHE
SCHEMBL27632288 0.70 LMNA (0.57) NPC1MAPTRAB9ALMNABCHE
SCHEMBL7188238 0.68 LMNA (0.55) NPC1MAPTRAB9ALMNABCHE
SCHEMBL7188233 0.68 LMNA (0.55) NPC1MAPTRAB9ALMNABCHE
SCHEMBL9779258 0.67 MAPT (0.67) NPC1MAPTRAB9ALMNABCHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed