SCHEMBL8964936

SCHEMBL8964936

C=Cc1ccc(C(=O)C=Cc2ccc(C)c(C)c2)cc1

nearest known ligand 0.56

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.56
MEN1 O00255 1/20 0.51
KMT2A Q03164 1/20 0.51
ABCG2 Q9UNQ0 1/20 0.51
POLB P06746 2/20 0.51
KDM4E B2RXH2 1/20 0.51
ALDH1A1 P00352 1/20 0.51
LMNA P02545 1/20 0.51
HSP90AA1 P07900 1/20 0.51
SMN1; SMN2 Q16637 1/20 0.51
TDP1 Q9NUW8 1/20 0.51
MAOA P21397 2/20 0.50
MAOB P27338 2/20 0.50
RAB9A P51151 1/20 0.50
F3 P13726 1/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19193673 0.87 MAPT (0.58) MAPTMEN1KMT2AABCG2POLB
SCHEMBL8965212 0.86 F3 (0.69) MAPTMEN1KMT2APOLBALDH1A1
SCHEMBL8965208 0.86 F3 (0.69) MAPTMEN1KMT2APOLBALDH1A1
SCHEMBL30384171 0.86 F3 (0.69) MAPTMEN1KMT2APOLBALDH1A1
SCHEMBL8965057 0.84 ABCG2 (0.68) MEN1KMT2AABCG2
SCHEMBL8965097 0.84 ABCG2 (0.68) MAPTMEN1KMT2AABCG2KDM4E
SCHEMBL8965178 0.82 ALDH1A1 (0.57) MAPTMEN1KMT2APOLBALDH1A1
SCHEMBL8965685 0.82 MAPT (0.83) MAPTMEN1KMT2APOLBALDH1A1
SCHEMBL15304468 0.82 F3 (0.74) MAPTMEN1KMT2AALDH1A1LMNA
SCHEMBL15304472 0.82 SMN1; SMN2 (0.56) MAPTMEN1KMT2AABCG2POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed