SCHEMBL8965378

SCHEMBL8965378

Cc1c(/N=N/c2ccccc2)cnn1-c1ccccc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 8/20 0.48
RAB9A P51151 8/20 0.48
MAPT P10636 7/20 0.48
SMN1; SMN2 Q16637 5/20 0.48
HPGD P15428 3/20 0.48
TDP1 Q9NUW8 3/20 0.48
ALDH1A1 P00352 2/20 0.48
MAPK1 P28482 2/20 0.47
TRPA1 O75762 1/20 0.46
SLC9A1 P19634 1/20 0.44
SLC9A2 Q9UBY0 1/20 0.44
PTGS2 P35354 3/20 0.43
LMNA P02545 2/20 0.43
NFKB1 P19838 2/20 0.43
NFKB2 Q00653 2/20 0.43
RELA Q04206 2/20 0.43
PLA2G1B P04054 1/20 0.43
ATG4B Q9Y4P1 1/20 0.43
L3MBTL1 Q9Y468 2/20 0.42
NPSR1 Q6W5P4 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965380 1.00 NPC1 (0.48) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL8999254 0.80 RAB9A (0.54) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL8999319 0.80 NPC1 (0.46) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL8999252 0.80 RAB9A (0.54) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL8965768 0.80 NPC1 (0.46) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL4075897 0.77 FTO (0.48) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL15298089 0.77 FTO (0.48) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL3059609 0.75 MAPK1 (0.50) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL3841619 0.72 MAPK1 (0.58) NPC1RAB9AMAPTSMN1; SMN2HPGD
SCHEMBL8999418 0.71 MEN1 (0.49) NPC1RAB9AMAPTSMN1; SMN2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
EP-0428398-A2 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-22 EP disclosed
US-4654292-A HIGH RESOLUTION, FOR SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 1987-03-31 US disclosed