SCHEMBL8965768

SCHEMBL8965768

Oc1c(N=Nc2ccccc2)cnn1-c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 6/20 0.46
MAPT P10636 5/20 0.46
RAB9A P51151 5/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
LMNA P02545 3/20 0.46
NFKB1 P19838 2/20 0.46
NFKB2 Q00653 2/20 0.46
RELA Q04206 2/20 0.46
PLA2G1B P04054 1/20 0.46
ATG4B Q9Y4P1 1/20 0.46
MEN1 O00255 3/20 0.41
KMT2A Q03164 3/20 0.41
TDP1 Q9NUW8 3/20 0.41
ALDH1A1 P00352 2/20 0.41
GLO1 Q04760 1/20 0.41
HPGD P15428 1/20 0.41
CASP3 P42574 1/20 0.39
SENP7 Q9BQF6 1/20 0.39
SENP6 Q9GZR1 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8999319 1.00 NPC1 (0.46) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL15298089 0.90 FTO (0.48) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL4075897 0.90 FTO (0.48) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL8999418 0.86 MEN1 (0.49) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL8971101 0.86 MEN1 (0.49) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL4070857 0.85 POLB (0.55) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL12854629 0.85 POLB (0.55) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL8999252 0.80 RAB9A (0.54) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL8965378 0.80 NPC1 (0.48) NPC1MAPTRAB9ASMN1; SMN2LMNA
SCHEMBL8965380 0.80 NPC1 (0.48) NPC1MAPTRAB9ASMN1; SMN2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5576138-A MIXTURE OF RESIN, PHOTOSENSITIZER AND BENZOPHENONE COMPOUND TOKYO OHKA KOGYO CO., LTD. (JP) 1996-11-19 US disclosed
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed
EP-0428398-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-04-03 EP disclosed
US-5110706-A Photoresists for highly reflective substrates JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1992-05-05 US disclosed
US-5019479-A Photoresists for integrated circuits JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-28 US disclosed
EP-0239423-A2 Positive type radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1987-09-30 EP disclosed
US-4654292-A HIGH RESOLUTION, FOR SEMICONDUCTORS NIPPON ZEON CO., LTD. (JP) 1987-03-31 US disclosed