SCHEMBL8965407

SCHEMBL8965407

C=CC(=O)Oc1ccc(C(=O)C=Cc2ccc(OC)c(C)c2)cc1

nearest known ligand 0.62

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
TNFRSF1A P19438 2/20 0.62
ABCG2 Q9UNQ0 4/20 0.60
KMT2A Q03164 2/20 0.60
MEN1 O00255 1/20 0.60
CXCL12 P48061 2/20 0.56
LMNA P02545 2/20 0.56
MAPT P10636 2/20 0.56
KDM4E B2RXH2 2/20 0.56
CA1 P00915 1/20 0.54
CA2 P00918 1/20 0.54
MAPK1 P28482 1/20 0.54
F3 P13726 1/20 0.53
MAOA P21397 1/20 0.52
MAOB P27338 1/20 0.52
KRAS P01116 1/20 0.52
ALDH1A1 P00352 1/20 0.52
SMN1; SMN2 Q16637 1/20 0.52
CTSL P07711 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30467144 1.00 TNFRSF1A (0.62) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL8965410 1.00 TNFRSF1A (0.62) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL4725650 0.90 TNFRSF1A (0.76) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL3263018 0.87 TNFRSF1A (0.80) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL3263021 0.87 TNFRSF1A (0.80) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL8965097 0.86 ABCG2 (0.68) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL16265213 0.84 TNFRSF1A (0.58) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL8965834 0.84 TNFRSF1A (0.45) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL8964944 0.82 CTSL (0.74) TNFRSF1AABCG2KMT2AMEN1CXCL12
SCHEMBL8964940 0.82 CTSL (0.74) TNFRSF1AABCG2KMT2AMEN1CXCL12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed