SCHEMBL8965097

SCHEMBL8965097

C=Cc1ccc(C(=O)C=Cc2ccc(OC)c(C)c2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ABCG2 Q9UNQ0 4/20 0.68
MEN1 O00255 1/20 0.68
KMT2A Q03164 1/20 0.68
TNFRSF1A P19438 2/20 0.61
CA1 P00915 2/20 0.60
CA2 P00918 2/20 0.60
CXCL12 P48061 3/20 0.59
CTSL P07711 1/20 0.57
CYP1A1 P04798 1/20 0.56
CYP1A2 P05177 1/20 0.56
CYP2D6 P10635 1/20 0.56
CYP1B1 Q16678 1/20 0.56
ABCB1 P08183 1/20 0.56
PDE4A P27815 1/20 0.55
PDE4B Q07343 1/20 0.55
PDE4C Q08493 1/20 0.55
PDE4D Q08499 1/20 0.55
KDM4E B2RXH2 1/20 0.55
LMNA P02545 1/20 0.55
MAPT P10636 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965057 0.89 ABCG2 (0.68) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8964944 0.88 CTSL (0.74) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL31233066 0.88 CTSL (0.74) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL3263021 0.88 TNFRSF1A (0.80) ABCG2MEN1KMT2ATNFRSF1ACXCL12
SCHEMBL8964940 0.88 CTSL (0.74) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL3263018 0.88 TNFRSF1A (0.80) ABCG2MEN1KMT2ATNFRSF1ACXCL12
SCHEMBL30467144 0.86 TNFRSF1A (0.62) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8965410 0.86 TNFRSF1A (0.62) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8965407 0.86 TNFRSF1A (0.62) ABCG2MEN1KMT2ATNFRSF1ACA1
SCHEMBL8964936 0.84 MAPT (0.56) ABCG2MEN1KMT2AKDM4ELMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed