SCHEMBL8965729

SCHEMBL8965729

COc1cc(/C=C/C(=O)c2ccc(O)cc2)ccc1C

nearest known ligand 0.80

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.70
CA2 P00918 2/20 0.70
CTSL P07711 2/20 0.70
MEN1 O00255 3/20 0.69
KMT2A Q03164 3/20 0.69
ABCG2 Q9UNQ0 2/20 0.69
CXCL12 P48061 7/20 0.67
CAPN1 P07384 1/20 0.64
CTSB P07858 1/20 0.64
MAPT P10636 3/20 0.63
ALDH1A1 P00352 2/20 0.63
P4HB P07237 1/20 0.63
CALM1 P0DP23 1/20 0.63
RAB9A P51151 1/20 0.63
F3 P13726 1/20 0.63
XDH P47989 1/20 0.63
LMNA P02545 1/20 0.63
TNFRSF1A P19438 1/20 0.63
CXCR4 P61073 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8965726 1.00 CA1 (0.70) CA1CA2CTSLMEN1KMT2A
SCHEMBL30383073 1.00 CA1 (0.70) CA1CA2CTSLMEN1KMT2A
SCHEMBL8977121 0.92 ABCG2 (0.69) CA1CA2CTSLMEN1KMT2A
SCHEMBL8977123 0.92 ABCG2 (0.69) CA1CA2CTSLMEN1KMT2A
SCHEMBL8964940 0.89 CTSL (0.74) CA1CA2CTSLMEN1KMT2A
SCHEMBL8964944 0.89 CTSL (0.74) CA1CA2CTSLMEN1KMT2A
SCHEMBL31233066 0.89 CTSL (0.74) CA1CA2CTSLMEN1KMT2A
SCHEMBL25199646 0.89 ABCG2 (0.88) CA1CA2CTSLMEN1KMT2A
SCHEMBL3440656 0.89 ABCG2 (0.88) CA1CA2CTSLMEN1KMT2A
SCHEMBL3440660 0.89 ABCG2 (0.88) CA1CA2CTSLMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5525457-A Copolymers of unsaturated carboxylic acid, an epoxy-functional monomer, and cinnamoylphenyl group-monomer; high halation preventing effect, involves no sublimation of radiation absorbing components contained therein, possesses excellent heat resistance, dry etching performance, storage stability JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-06-11 US disclosed