SCHEMBL8990194

SCHEMBL8990194

Cc1cc(CSCc2ccccc2)c(O)c(CSCc2ccccc2)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
BCHE P06276 1/20 0.47
EGFR P00533 3/20 0.43
ERBB2 P04626 3/20 0.43
LMNA P02545 2/20 0.41
MAPT P10636 2/20 0.41
KDM4E B2RXH2 1/20 0.41
AMY1A P0DUB6 1/20 0.41
CYP2C19 P33261 1/20 0.41
ALDH1A1 P00352 1/20 0.38
HPGD P15428 1/20 0.38
KLK7 P49862 1/20 0.38
APEX1 P27695 1/20 0.38
PKM P14618 1/20 0.38
BCL2 P10415 1/20 0.37
BCL2L1 Q07817 1/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6655944 0.87 EGFR (0.46) EGFRERBB2LMNAMAPTKDM4E
SCHEMBL1275145 0.83 SHBG (0.43) EGFRERBB2LMNAMAPTKDM4E
Methyl Alcohol SCHEMBL29261078 0.80 CYP2C19 (0.56) LMNAMAPTKDM4ECYP2C19ALDH1A1
SCHEMBL670158 0.77 BCL2 (0.57) AMY1ACYP2C19BCL2BCL2L1SMN1; SMN2
SCHEMBL28700543 0.76 ALOX5 (0.46) LMNAMAPTKDM4ECYP2C19MEN1
SCHEMBL1275477 0.76 HSPA5 (0.47) EGFRERBB2LMNAMAPTCYP2C19
SCHEMBL3691565 0.76 AMY1A (0.44) KDM4EAMY1AALDH1A1HPGDBCL2
SCHEMBL1904809 0.76 AMY1A (0.58) AMY1ACYP2C19BCL2BCL2L1SMN1; SMN2
SCHEMBL8990183 0.75 AMY1A (0.42) BCHELMNAMAPTKDM4EAMY1A
SCHEMBL14648333 0.75 CYP1A2 (0.59) EGFRERBB2LMNAMAPTCYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0273013-B2 Substituted phenols as stabilizers CIBA GEIGY AG (CH) 1996-07-24 EP disclosed
US-5376290-A For elastomers; heat and oxidation resistance, photostability CIBA-GEIGY CORPORATION (US) 1994-12-27 US disclosed