SCHEMBL8993086

SCHEMBL8993086

CCCCN(CC)C(O)CC

nearest known ligand 0.34

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA12 O43570 3/20 0.34
CA1 P00915 3/20 0.34
CA9 Q16790 3/20 0.34
MMP1 P03956 1/20 0.34
MMP2 P08253 1/20 0.34
MMP3 P08254 1/20 0.34
MMP8 P22894 1/20 0.34
CA2 P00918 1/20 0.34
ALDH1A1 P00352 2/20 0.32
ALDH2 P05091 1/20 0.32
FDPS P14324 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL381408 0.90 MMP1 (0.37) CA12CA1CA9MMP1MMP2
SCHEMBL15121410 0.88 MMP1 (0.35) CA12CA1CA9MMP1MMP2
SCHEMBL15121451 0.88 MMP1 (0.35) CA12CA1CA9MMP1MMP2
SCHEMBL30229787 0.86 DNM1 (0.39) CA12CA1CA9MMP1MMP2
SCHEMBL27855544 0.85 FDPS (0.39) FDPS
SCHEMBL16105557 0.84 ALDH1A1 (0.32) ALDH1A1
SCHEMBL30229983 0.84 DNM1 (0.42) CA12CA1CA9CA2
SCHEMBL30230081 0.84 DNM1 (0.42) CA12CA1CA9CA2
SCHEMBL8523714 0.83 DNM1 (0.40) CA12CA1CA9CA2
SCHEMBL4931093 0.83 DNM1 (0.40) CA12CA1CA9CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114573525-B Preparation method and application of annular quaternary ammonium salt electrolyte 江苏国泰超威新材料有限公司 2024-10-08 CN disclosed
EP-0720636-A1 ELECTRO-DIPCOATING PAINT AND PROCESS FOR DIP-COATING ELECTROCONDUCTIVE SUBSTRATES BASF Lacke + Farben AG (DE) 1996-07-10 EP disclosed
EP-0705308-A1 ELECTROPHORETIC ENAMEL AND PROCESS FOR LACQUERING ELECTROCONDUCTIVE SUBSTRATES BASF Lacke + Farben AG (DE) 1996-04-10 EP disclosed
WO-1995008597-A1 ELECTRO-DIPCOATING PAINT AND PROCESS FOR DIP-COATING ELECTROCONDUCTIVE SUBSTRATES BASF LACKE + FARBEN AG (DE) 1995-03-30 WO disclosed
WO-1995000593-A2 ELECTROPHORETIC ENAMEL AND PROCESS FOR LACQUERING ELECTROCONDUCTIVE SUBSTRATES BASF LACKE + FARBEN AG (DE) 1995-01-05 WO disclosed