Potassium Ion

Potassium Ion

SCHEMBL8994443

CC(CO)S(=O)(=O)[O-].[K+]

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA

The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10812476 0.94 TP53 (0.46)
Zinc Ion SCHEMBL491386 0.94 TP53 (0.46)
SCHEMBL490848 0.94
SCHEMBL30586081 0.94 TP53 (0.46)
Isobutanol SCHEMBL28277108 0.77 TP53 (0.58)
Potassium Ion SCHEMBL30241974 0.74
SCHEMBL11684833 0.73 TSHR (0.41)
Potassium Ion SCHEMBL6228640 0.72
Potassium Ion SCHEMBL29407428 0.72
SCHEMBL490897 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0585071-B1 Process for making sodium acylisethionates HOECHST CELANESE CORP (US) 1996-07-24 EP claimed
US-5384421-A Process for making sodium acylisethionates HOECHST CELANESE CORPORATION (US) 1995-01-24 US claimed
EP-0585071-A1 Process for making sodium acylisethionates HOECHST CELANESE CORPORATION (US) 1994-03-02 EP claimed
US-20200170918-A1 NATURALLY THICKENED COSMETIC CLEANING AGENTS HENKEL AG & CO. KGAA (DE) 2020-06-04 US disclosed
US-9895300-B2 Mild cosmetic cleaning agent HENKEL AG & CO. KGAA (DE) 2018-02-20 US disclosed
US-20160287504-A1 MILD COSMETIC CLEANING AGENT HENKEL AG & CO. KGAA (DE) 2016-10-06 US disclosed
EP-0585071-B1 Process for making sodium acylisethionates HOECHST CELANESE CORP (US) 1996-07-24 EP disclosed
US-5384421-A Process for making sodium acylisethionates HOECHST CELANESE CORPORATION (US) 1995-01-24 US disclosed
EP-0585071-A1 Process for making sodium acylisethionates HOECHST CELANESE CORPORATION (US) 1994-03-02 EP disclosed