SCHEMBL9001391

SCHEMBL9001391

Nc1c(F)cc(-c2cc(F)c(N)c(F)c2)cc1F

nearest known ligand 0.42

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.42
HDAC6 Q9UBN7 1/20 0.42
ALDH1A1 P00352 2/20 0.40
TP53 P04637 1/20 0.40
CYP3A4 P08684 1/20 0.40
TSHR P16473 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
CA1 P00915 3/20 0.36
CA2 P00918 3/20 0.36
CA9 Q16790 3/20 0.36
VRK1 Q99986 1/20 0.35
KIF11 P52732 1/20 0.34
CA3 P07451 1/20 0.34
ALOX5AP P20292 1/20 0.30
FEN1 P39748 1/20 0.30
ESR1 P03372 1/20 0.30
ESR2 Q92731 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15801325 0.86 ALDH1A1 (0.43) HDAC1HDAC6ALDH1A1TP53CYP3A4
SCHEMBL30576799 0.84 KIF11 (0.55) HDAC1HDAC6ALDH1A1TP53CYP3A4
SCHEMBL1337228 0.84 AKR1C2 (0.47) ALDH1A1CYP3A4TDP1KIF11
SCHEMBL23240341 0.82 ALDH1A1 (0.44) HDAC1HDAC6ALDH1A1CA1CA2
SCHEMBL14586543 0.80 PTGS2 (0.42) ALDH1A1TP53CYP3A4TSHRTDP1
SCHEMBL31505233 0.80 KIF11 (0.38) HDAC1HDAC6ALDH1A1TP53CYP3A4
SCHEMBL23335214 0.80 KIF11 (0.38) HDAC1HDAC6ALDH1A1TP53CYP3A4
SCHEMBL16127358 0.80 HDAC1 (0.35) HDAC1HDAC6CA1CA2CA9
SCHEMBL5080236 0.79 HDAC1 (0.42) HDAC1HDAC6ALDH1A1TP53CYP3A4
SCHEMBL113484 0.79 ALDH1A1 (0.48) HDAC1HDAC6ALDH1A1TDP1CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106328896-A Graphene network sulfur electrode material and preparation method thereof 成都新柯力化工科技有限公司 2017-01-11 CN claimed
WO-2025100202-A1 POLYIMIDE, AND POLYIMIDE THIN FILM 本州化学工業株式会社 2025-05-15 WO disclosed
US-20240376267-A1 POLYIMIDE RESIN MATERIAL FOR COLORLESS TRANSPARENT PROCESSED PRODUCT AND NOVEL POLYIMIDE HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) 2024-11-14 US disclosed
WO-2024101441-A1 POLYIMIDE, POLYIMIDE THIN FILM 本州化学工業株式会社 2024-05-16 WO disclosed
WO-2024101442-A1 POLYIMIDE, POLYIMIDE THIN FILM, AND POLYIMIDE MATERIAL FOR ELECTRONIC APPARATUS/DEVICE 本州化学工業株式会社 2024-05-16 WO disclosed
WO-2022244581-A1 POLYIMIDE RESIN MATERIAL FOR COLORLESS TRANSPARENT PROCESSED ARTICLE, AND NEW POLYIMIDE 本州化学工業株式会社 2022-11-24 WO disclosed
CN-113402882-A Composition for forming release layer 日产化学工业株式会社 2021-09-17 CN disclosed
US-20210189126-A1 DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER NISSAN CHEMICAL CORPORATION (JP) 2021-06-24 US disclosed
US-20200317915-A1 DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER NISSAN CHEMICAL CORPORATION (JP) 2020-10-08 US disclosed
US-20200317963-A1 DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER NISSAN CHEMICAL CORPORATION (JP) 2020-10-08 US disclosed
EP-3467039-A1 DETACHABLE LAYER-FORMING COMPOSITION AND DETACHABLE LAYER Nissan Chemical Corporation (JP) 2019-04-10 EP disclosed
CN-106328896-A Graphene network sulfur electrode material and preparation method thereof 成都新柯力化工科技有限公司 2017-01-11 CN disclosed
US-9200134-B2 Composition for flexible substrate and flexible substrate CHI MEI CORPORATION (TW) 2015-12-01 US disclosed
US-9200134-B2 Composition for flexible substrate and flexible substrate CHI MEI CORPORATION (TW) 2015-12-01 US disclosed
US-20140378588-A1 COMPOSITION FOR FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE CHI MEI CORPORATION (TW) 2014-12-25 US disclosed
US-20140378588-A1 COMPOSITION FOR FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE CHI MEI CORPORATION (TW) 2014-12-25 US disclosed
US-20140171588-A1 COMPOSITION FOR FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE FORMED FROM THE SAME CHI MEI CORPORATION (TW) 2014-06-19 US disclosed
EP-0541510-B1 Wholly aromatic polyamide copolymer TEIJIN LTD (JP) 1996-09-18 EP disclosed
US-5006629-A Excellent heat, fire, chemical resistance; spinning and shaping stability; superior mechanical strength TEIJIN LIMITED (JP) 1991-04-09 US disclosed
EP-0367535-A1 Wholly aromatic polyamide copolymer TEIJIN LIMITED (JP) 1990-05-09 EP disclosed