SCHEMBL9003752

SCHEMBL9003752

O=C(O)c1ccccc1C1(C(=O)O)C=CC(C(=O)O)C=C1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.41
ALOX15 P16050 2/20 0.41
KDM4E B2RXH2 3/20 0.36
HPGD P15428 2/20 0.36
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA4 P22748 2/20 0.36
CA7 P43166 2/20 0.36
CA9 Q16790 2/20 0.36
HMGB1 P09429 1/20 0.36
CA6 P23280 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
NAPRT Q6XQN6 1/20 0.36
CA14 Q9ULX7 1/20 0.36
MAPT P10636 3/20 0.35
HDAC8 Q9BY41 1/20 0.35
POLB P06746 2/20 0.34
AKR1C3 P42330 1/20 0.34
TDP1 Q9NUW8 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9003583 0.81 THRB (0.33) MAPTTDP1THRBCRHBPCRHR2
SCHEMBL9190141 0.76 ALDH1A1 (0.38) ALDH1A1ALOX15KDM4EHPGDCA12
SCHEMBL29408722 0.67 ALDH1A1 (0.54) ALDH1A1ALOX15KDM4EHPGDCA12
SCHEMBL6443676 0.67 MAPT (0.34) ALDH1A1ALOX15SMN1; SMN2MAPTTDP1
SCHEMBL20594607 0.66 CYP2D6 (0.40) L3MBTL1CYP3A4CYP2C9CRHBPCRHR2
SCHEMBL9683566 0.66 NPSR1 (0.33) ALDH1A1KDM4EHPGDCA12CA1
Phthalic Acid SCHEMBL16341731 0.65 ALDH1A1 (0.93) ALDH1A1ALOX15KDM4EHPGDCA12
SCHEMBL30293277 0.64 ALDH1A1 (0.54) ALDH1A1ALOX15KDM4EHPGDCA12
SCHEMBL23920039 0.63 AKR1C1 (0.60) ALDH1A1ALOX15KDM4EHPGDCA12
SCHEMBL22745669 0.63 AKR1C1 (0.55) ALDH1A1ALOX15KDM4EHPGDCA12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113527101-B Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component 信越化学工业株式会社 2024-04-23 CN disclosed
CN-113527101-A Novel compound, polymer and method for producing same, photosensitive resin composition, method for forming pattern, cured film, and electronic component 信越化学工业株式会社 2021-10-22 CN disclosed
CN-110229257-B Polymerizable monomer, curable composition, and resin member 德山齿科株式会社 2021-07-06 CN disclosed
US-5491201-A HEAT/CHEMICAL RESISTANCE; HIGH MECHANICAL STRENGTH THE DOW CHEMICAL COMPANY (US) 1996-02-13 US disclosed
US-5338828-A Mesogenic cyclic imino ether-containing compositions and polymerization products thereof THE DOW CHEMICAL COMPANY (US) 1994-08-16 US disclosed
US-5281675-A Liquid crystal polymers THE DOW CHEMICAL COMPANY (US) 1994-01-25 US disclosed