SCHEMBL9006591

SCHEMBL9006591

O=C(C=Cc1ccc(OC(F)=C(F)F)cc1)C=Cc1ccc(OC(F)=C(F)F)cc1

nearest known ligand 0.58

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
F3 P13726 3/20 0.58
HSD11B1 P28845 2/20 0.53
CYP2D6 P10635 2/20 0.50
CYP2C9 P11712 2/20 0.50
TYR P14679 1/20 0.50
CYP1A2 P05177 4/20 0.49
PLIN1 O60240 1/20 0.47
ALDH1A1 P00352 1/20 0.47
LMNA P02545 1/20 0.47
MAPT P10636 1/20 0.47
RECQL P46063 1/20 0.47
PLIN5 Q00G26 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
ABHD5 Q8WTS1 1/20 0.47
GSK3B P49841 2/20 0.46
KMT2A Q03164 1/20 0.46
BACE1 P56817 1/20 0.46
STAT3 P40763 1/20 0.45
HSD17B3 P37058 1/20 0.44
JUN P05412 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006668 1.00 F3 (0.58) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006693 0.94 HSD11B1 (0.66) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006689 0.94 HSD11B1 (0.66) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006741 0.94 F3 (0.62) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006742 0.94 F3 (0.62) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006616 0.94 F3 (0.59) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006612 0.94 F3 (0.59) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006511 0.92 CYP1A2 (0.64) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006512 0.92 F3 (0.50) F3HSD11B1CYP2D6CYP2C9TYR
SCHEMBL9006435 0.92 F3 (0.73) F3ALDH1A1MAPTGSK3BKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed