SCHEMBL9006619

SCHEMBL9006619

O=C1C=CC(=O)c2cc(OC(F)=C(F)F)ccc21

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ TOP1 P11387 1/20 0.45
▸ CDC25B P30305 2/20 0.35
▸ IDO1 P14902 1/20 0.35
▸ MAOA P21397 1/20 0.35
▸ MAOB P27338 1/20 0.35
▸ AKT1 P31749 1/20 0.35
▸ SNCA P37840 1/20 0.35
▸ MAP2K1 Q02750 1/20 0.35
▸ PIN1 Q13526 1/20 0.35
▸ EHMT2 Q96KQ7 1/20 0.35
▸ NSD1 Q96L73 1/20 0.35
▸ EHMT1 Q9H9B1 1/20 0.35
▸ CA1 P00915 1/20 0.35
▸ CA2 P00918 1/20 0.35
▸ CA4 P22748 1/20 0.35
▸ CA7 P43166 1/20 0.35
▸ CA9 Q16790 1/20 0.35
▸ PIM1 P11309 1/20 0.30
▸ KDM4E B2RXH2 1/20 0.30
▸ MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006611 0.88 MAPT (0.40) TOP1MAPT
SCHEMBL14999383 0.81 ESR1 (0.42) MAOAMAOBMAPTRAB9AMCL1
SCHEMBL9006654 0.81 ELANE (0.35) TOP1MAOAMAOBPKMRAB9A
SCHEMBL9314112 0.77 ALOX15 (0.39) MAOAMAOBCA1CA2CA4
SCHEMBL9006775 0.77 TOP1 (0.58) TOP1CDC25BIDO1PIN1KDM4E
SCHEMBL10377985 0.76 LMNA (0.47) TOP1CA2CA9KDM4EMAPT
SCHEMBL16743475 0.75 MAPT (0.37) MAOAMAOBMAPTRAB9A
SCHEMBL8665021 0.72 KMT2A (0.39) CA9KDM4EMAPTRAB9A
SCHEMBL11352811 0.71 CA1 (0.58) TOP1IDO1SNCACA1CA2
SCHEMBL4530562 0.71 RAB9A (0.35) MAPTPKMRAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 — — US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 — — EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 — — US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 — — WO disclosed
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