SCHEMBL9006644

SCHEMBL9006644

CC(=O)c1ccc(C=CC(=O)C=Cc2ccc(C(C)(c3ccc(OC(F)=C(F)F)cc3)c3ccc(OC(F)=C(F)F)cc3)cc2)cc1

nearest known ligand 0.49

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.49
CYP1A2 P05177 2/20 0.47
F3 P13726 2/20 0.43
CYP1A1 P04798 4/20 0.43
CYP1B1 Q16678 4/20 0.43
MAOB P27338 3/20 0.43
GPR183 P32249 1/20 0.39
HSD11B1 P28845 1/20 0.37
BCHE P06276 1/20 0.37
GSK3B P49841 1/20 0.36
BACE1 P56817 1/20 0.36
MEN1 O00255 1/20 0.36
STAT3 P40763 1/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006530 0.91 KMT2A (0.57) KMT2ACYP1A2F3HSD11B1BCHE
SCHEMBL9006544 0.88 F3 (0.60) KMT2ACYP1A2F3CYP1A1CYP1B1
SCHEMBL9006540 0.88 F3 (0.60) KMT2ACYP1A2F3CYP1A1CYP1B1
SCHEMBL9006732 0.88 CYP1A2 (0.60) CYP1A2F3CYP1A1CYP1B1MAOB
SCHEMBL9006794 0.88 HSD11B1 (0.53) KMT2ACYP1A2F3CYP1A1CYP1B1
SCHEMBL9006799 0.88 HSD11B1 (0.53) KMT2ACYP1A2F3CYP1A1CYP1B1
SCHEMBL9006633 0.88 CYP1A2 (0.49) KMT2ACYP1A2F3CYP1A1CYP1B1
SCHEMBL9006726 0.88 CYP1A2 (0.60) CYP1A2F3CYP1A1CYP1B1MAOB
SCHEMBL9006637 0.88 CYP1A2 (0.49) KMT2ACYP1A2F3CYP1A1CYP1B1
SCHEMBL9006422 0.87 MAPT (0.46) KMT2AMAOBMEN1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed