SCHEMBL9006530

SCHEMBL9006530

CC(=O)c1ccc(C=CC(=O)C=Cc2ccc(OC(F)=C(F)F)cc2)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.57
F3 P13726 3/20 0.51
HSD11B1 P28845 2/20 0.44
GSK3B P49841 1/20 0.42
BACE1 P56817 1/20 0.42
MAPT P10636 3/20 0.42
HPGD P15428 1/20 0.42
RAB9A P51151 1/20 0.42
BCHE P06276 1/20 0.42
LMNA P02545 3/20 0.42
STAT3 P40763 1/20 0.42
TDP1 Q9NUW8 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
TYR P14679 1/20 0.41
KDM4E B2RXH2 1/20 0.41
MEN1 O00255 1/20 0.41
TTR P02766 1/20 0.41
TP53 P04637 1/20 0.41
CYP3A4 P08684 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9006644 0.91 KMT2A (0.49) KMT2AF3HSD11B1GSK3BBACE1
SCHEMBL9006442 0.91 KMT2A (0.55) KMT2AF3MAPTHPGDRAB9A
SCHEMBL9006445 0.91 KMT2A (0.55) KMT2AF3MAPTHPGDRAB9A
SCHEMBL9006668 0.89 F3 (0.58) KMT2AF3HSD11B1GSK3BBACE1
SCHEMBL9006591 0.89 F3 (0.58) KMT2AF3HSD11B1GSK3BBACE1
SCHEMBL9006789 0.87 XDH (0.51) KMT2AF3HSD11B1GSK3BBACE1
SCHEMBL9006787 0.87 XDH (0.51) KMT2AF3HSD11B1GSK3BBACE1
SCHEMBL9006435 0.85 F3 (0.73) KMT2AF3GSK3BBACE1MAPT
SCHEMBL9006439 0.85 F3 (0.73) KMT2AF3GSK3BBACE1MAPT
SCHEMBL9006488 0.84 MAPT (0.57) KMT2AMAPTHPGDRAB9ALMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US claimed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP claimed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US claimed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO claimed
US-5489623-A APPLYING POLYMER TO SURFACE, EXPOSING TO INCIDENT PHOTONICRADIATION TO RENDER PORTIONS LESS SOLUBLE OR DISPERSIBLE THE DOW CHEMICAL COMPANY (US) 1996-02-06 US disclosed
EP-0676062-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1995-10-11 EP disclosed
US-5426164-A Solvent and chemical resistant coatings and photoresists; photocuring of perfluorovinyl polymers containing photo active sites; cyclization THE DOW CHEMICAL COMPANY (US) 1995-06-20 US disclosed
WO-1994015258-A1 PHOTODEFINABLE POLYMERS CONTAINING PERFLUOROCYCLOBUTANE GROUPS THE DOW CHEMICAL COMPANY (US) 1994-07-07 WO disclosed