Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.35 |
| ▸ | GABRB2 | P47870 | 1/20 | 0.35 |
| ▸ | KIF11 | P52732 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.31 |
| ▸ | NISCH | Q9Y2I1 | 1/20 | 0.30 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.30 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.30 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.30 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.30 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.30 |
| ▸ | GRIN2C | Q14957 | 1/20 | 0.30 |
| ▸ | GRIN3A | Q8TCU5 | 1/20 | 0.30 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.30 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1201242 | 0.78 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL26002434 | 0.78 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL29987688 | 0.78 | ALDH1A1 (0.46) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL24343243 | 0.77 | ALDH1A1 (0.41) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| Hydrochloric Acid SCHEMBL2870378 | 0.76 | ALDH1A1 (0.44) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL22059185 | 0.76 | ALDH1A1 (0.44) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL6249446 | 0.76 | ALDH1A1 (0.40) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL20015667 | 0.74 | ALDH1A1 (0.43) | ALDH1A1TDP1TSHRCA2GABRA1 | |
| SCHEMBL24433645 | 0.74 | RXRA (0.36) | ALDH1A1CA2KIF11KDM4EKMT2A | |
| SCHEMBL13439630 | 0.74 | ALDH1A1 (0.39) | ALDH1A1TDP1TSHRCA2GABRA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4731689-A1 | METHOD FOR THE PRODUCTION OF THERMOPLASTIC POLYOXAZOLIDINONE | Covestro Deutschland AG (DE) | 2026-04-29 | — | — | EP | disclosed |
| EP-4200351-B1 | METHOD FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | COVESTRO DEUTSCHLAND AG (DE) | 2025-11-19 | — | — | EP | disclosed |
| EP-4448605-B1 | PROCESS FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | COVESTRO DEUTSCHLAND AG (DE) | 2025-11-19 | — | — | EP | disclosed |
| EP-4200352-B1 | METHOD FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | COVESTRO DEUTSCHLAND AG (DE) | 2025-11-19 | — | — | EP | disclosed |
| EP-4200353-B1 | METHOD FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | COVESTRO DEUTSCHLAND AG (DE) | 2025-11-19 | — | — | EP | disclosed |
| US-12466913-B2 | Method for the production of a thermoplastic polyoxazolidinone | COVESTRO DEUTSCHLAND AG (DE) | 2025-11-11 | — | — | US | disclosed |
| US-12378348-B2 | Method for the production of a thermoplastic polyoxazolidinone | COVESTRO DEUTSCHLAND AG (DE) | 2025-08-05 | — | — | US | disclosed |
| US-20250043061-A1 | PROCESS FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | COVESTRO DEUTSCHLAND AG (DE) | 2025-02-06 | — | — | US | disclosed |
| WO-2024260858-A1 | METHOD FOR THE PRODUCTION OF THERMOPLASTIC POLYOXAZOLIDINONE | COVESTRO DEUTSCHLAND AG (DE) | 2024-12-26 | — | — | WO | disclosed |
| EP-4448605-A1 | PROCESS FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | Covestro Deutschland AG (DE) | 2024-10-23 | — | — | EP | disclosed |
| EP-3960787-A1 | METHOD FOR THE PRODUCTION OF A THERMOPLASTIC POLYOXAZOLIDINONE | Covestro Deutschland AG (DE) | 2022-03-02 | — | — | EP | disclosed |
| WO-2013047902-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM THEREFROM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2013-04-04 | — | — | WO | disclosed |
| WO-2012043866-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN | FUJIFILM CORPORATION (JP) | 2012-04-05 | — | — | WO | disclosed |
| EP-1454958-B1 | LACTIC ACID POLYMER COMPOSITION AND MOLDED OBJECT THEREOF | NEW JAPAN CHEM CO LTD (JP) | 2006-10-04 | — | — | EP | disclosed |
| US-20050001349-A1 | Lactic acid polymer composition and molded object thereof | NEW JAPAN CHEMICAL CO., LTD. (JP) | 2005-01-06 | — | — | US | disclosed |
| EP-1454958-A1 | LACTIC ACID POLYMER COMPOSITION AND MOLDED OBJECT THEREOF | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 2004-09-08 | — | — | EP | disclosed |
| JP-2003257889-A | SOLUTION MATERIAL FOR METAL-ORGANIC CHEMICAL VAPOR DEPOSITION CONTAINING β-DIKETONATE COMPLEX OF COPPER (II) AND COPPER THIN FILM FORMED USING THE SAME | MITSUBISHI MATERIALS CORP | 2003-09-12 | — | — | JP | disclosed |
| US-5973076-A | MOLDING; CONTROLLING TEMPERATURE IN PRESENCE OF AN AMIDE COMPOUND | NEW JAPAN CHEMICAL CO., LTD. (JP) | 1999-10-26 | — | — | US | disclosed |
| EP-0776933-B1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEM CO LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0776933-A1 | Polybutene-1 resin composition and a method of accelerating the crystal transformation | NEW JAPAN CHEMICAL CO.,LTD. (JP) | 1997-06-04 | — | — | EP | disclosed |