SCHEMBL904337

SCHEMBL904337

CCC(C)(C)C(=O)OCCCC(=O)Oc1cc(C(F)(F)F)cc(C(F)(F)F)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.33
PPARA Q07869 2/20 0.33
FAAH O00519 2/20 0.33
PPARD Q03181 1/20 0.33
PDK2 Q15119 1/20 0.32
RXRA P19793 1/20 0.32
RXRB P28702 1/20 0.32
RXRG P48443 1/20 0.32
HDAC3 O15379 1/20 0.32
HDAC4 P56524 1/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC7 Q8WUI4 1/20 0.32
HDAC2 Q92769 1/20 0.32
HDAC10 Q969S8 1/20 0.32
HDAC11 Q96DB2 1/20 0.32
HDAC8 Q9BY41 1/20 0.32
HDAC6 Q9UBN7 1/20 0.32
HDAC9 Q9UKV0 1/20 0.32
HDAC5 Q9UQL6 1/20 0.32
GPR35 Q9HC97 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14962528 0.84 ALDH1A1 (0.36) ALDH1A1RXRARXRBRXRGGPR35
SCHEMBL2735067 0.81 ALDH1A1 (0.40) ALDH1A1FAAHRXRARXRBRXRG
SCHEMBL1998642 0.80 KMT2A (0.41) FAAHRXRARXRBRXRGKDM4E
SCHEMBL1996035 0.76 BCL9 (0.44) ALDH1A1FAAHRXRARXRBRXRG
SCHEMBL106972 0.73 MAPT (0.37) ALDH1A1RXRARXRBRXRGGPR35
SCHEMBL13059564 0.73 RIPK1 (0.40) ALDH1A1RXRARXRBRXRG
SCHEMBL10932423 0.73 PDK2 (0.51) FAAHPDK2RXRARXRBRXRG
SCHEMBL2191360 0.73 ESR1 (0.44) ALDH1A1RXRARXRBRXRGGPR35
SCHEMBL29009999 0.72 SCN9A (0.40) FAAHRXRARXRBRXRGKDM4E
SCHEMBL19821844 0.72 TSHR (0.48) ALDH1A1L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 US disclosed
US-9034558-B2 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern FUJIFILM CORPORATION (JP) 2015-05-19 US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 US disclosed
US-20130115557-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2013-05-09 US disclosed
WO-2012043866-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-04-05 WO disclosed