Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PNP | P00491 | 2/20 | 0.31 |
| ▸ | ABL1 | P00519 | 1/20 | 0.31 |
| ▸ | RIN1 | Q13671 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.30 |
| ▸ | ACHE | P22303 | 1/20 | 0.30 |
| ▸ | GDA | Q9Y2T3 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17186348 | 0.68 | TRPC5 (0.31) | — | |
| Hydrochloric Acid SCHEMBL18605188 | 0.68 | TRPC5 (0.31) | — | |
| SCHEMBL29910050 | 0.64 | GDA (0.33) | ALDH1A1GDA | |
| SCHEMBL30838807 | 0.63 | GDA (0.32) | GDA | |
| SCHEMBL5795982 | 0.59 | — | — | |
| SCHEMBL2044444 | 0.58 | PNP (0.37) | PNPABL1RIN1ALDH1A1 | |
| SCHEMBL4455591 | 0.54 | — | — | |
| SCHEMBL21169645 | 0.54 | — | — | |
| SCHEMBL7011289 | 0.53 | ATIC (0.36) | ALDH1A1GDA | |
| SCHEMBL5634577 | 0.53 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2278399-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2013-05-15 | — | — | EP | disclosed |
| EP-1367440-B1 | Positive-working resist composition | FUJIFILM CORP (JP) | 2011-09-21 | — | — | EP | disclosed |
| EP-2278398-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-2278400-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-2278399-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| EP-2278397-A2 | Positive-working resist composition | Fujifilm Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| US-6939662-B2 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2005-09-06 | — | — | US | disclosed |
| US-20040005512-A1 | Positive-working resist composition | FUJI PHOTO FILM CO., LTD. | 2004-01-08 | — | — | US | disclosed |
| EP-1367440-A2 | Positive-working resist composition | Fuji Photo Film Co., Ltd. (JP) | 2003-12-03 | — | — | EP | disclosed |