Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | MGAM | O43451 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | SI | P14410 | 1/20 | 0.33 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.33 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | FABP7 | O15540 | 1/20 | 0.32 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28338310 | 0.92 | ALDH1A1 (0.42) | HTTALDH1A1TSHRNPC1RAB9A | |
| SCHEMBL906207 | 0.85 | ALDH1A1 (0.36) | ALDH1A1TSHRLMNAHSD17B10ALOX15 | |
| SCHEMBL18211788 | 0.83 | HTT (0.48) | HTTALDH1A1TSHRNPC1RAB9A | |
| SCHEMBL94679 | 0.80 | ALDH1A1 (0.54) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL2519772 | 0.80 | THRB (0.40) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| Ethyl Acetate SCHEMBL27877734 | 0.79 | ALDH1A1 (0.50) | HTTALDH1A1TSHRNPC1RAB9A | |
| SCHEMBL906567 | 0.78 | HTT (0.41) | HTTALDH1A1TSHRHSD17B10 | |
| Hydrochloric Acid SCHEMBL27667582 | 0.78 | ALDH1A1 (0.52) | ALDH1A1TSHRSMN1; SMN2LMNAHSD17B10 | |
| SCHEMBL906347 | 0.78 | HTT (0.43) | HTTALDH1A1TSHRHSD17B10THRB | |
| SCHEMBL36595 | 0.77 | TSHR (0.48) | HTTALDH1A1TSHRHSD17B10THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| EP-1806370-B1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| EP-2277929-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2315078-B1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| EP-2468780-A1 | Copolymer and top coating composition | JSR Corporation (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120101205-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| EP-1818723-B1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR CORP (JP) | 2011-05-04 | — | — | EP | disclosed |
| EP-2277929-A1 | Copolymer and top coating composition | JSR Corporation (JP) | 2011-01-26 | — | — | EP | disclosed |
| US-20100266953-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |