Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.47 |
| ▸ | FABP7 | O15540 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | AKR1B1 | P15121 | 1/20 | 0.41 |
| ▸ | PAM | P19021 | 1/20 | 0.41 |
| ▸ | TXNRD1 | Q16881 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 1/20 | 0.39 |
| ▸ | CNR2 | P34972 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | XBP1 | P17861 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL906233 | 0.88 | CES1 (0.45) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL28073968 | 0.86 | CES1 (0.39) | CES1FABP7ALDH1A1MAPK1L3MBTL1 | |
| SCHEMBL2833902 | 0.80 | CES1 (0.50) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL6696083 | 0.80 | ALDH1A1 (0.61) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL394740 | 0.78 | ALDH1A1 (0.56) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL9235730 | 0.78 | ALDH1A1 (0.46) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL9116026 | 0.78 | ALDH1A1 (0.46) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL27918597 | 0.78 | CES1 (0.48) | CES1ALDH1A1MAPK1L3MBTL1CES2 | |
| SCHEMBL28073962 | 0.77 | ALDH1A1 (0.51) | FABP7ALDH1A1MAPK1L3MBTL1SMN1; SMN2 | |
| SCHEMBL28582716 | 0.77 | CES1 (0.52) | CES1ALDH1A1MAPK1L3MBTL1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9182674-B2 | Immersion upper layer film forming composition and method of forming photoresist pattern | JSR CORPORATION (JP) | 2015-11-10 | — | — | US | disclosed |
| EP-2468780-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2013-11-13 | — | — | EP | disclosed |
| US-8580482-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2013-11-12 | — | — | US | disclosed |
| CN-101080674-B | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP | 2013-09-18 | — | — | CN | disclosed |
| EP-1806370-B1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR CORP (JP) | 2013-05-22 | — | — | EP | disclosed |
| EP-2277929-B1 | Copolymer and top coating composition | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-20120282553-A1 | IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR CORPORATION (JP) | 2012-11-08 | — | — | US | disclosed |
| EP-2315078-B1 | Upper layer film forming composition for liquid immersion and method of forming photoresist pattern | JSR CORP (JP) | 2012-10-17 | — | — | EP | disclosed |
| EP-2468780-A1 | Copolymer and top coating composition | JSR Corporation (JP) | 2012-06-27 | — | — | EP | disclosed |
| US-20120101205-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2012-04-26 | — | — | US | disclosed |
| US-20100266953-A1 | COPOLYMER AND TOP COATING COMPOSITION | JSR CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-7781142-B2 | Copolymer and top coating composition | JSR CORPORATION (JP) | 2010-08-24 | — | — | US | disclosed |
| US-7709182-B2 | Composition for forming antireflection film, layered product, and method of forming resist pattern | JSR CORPORATION (JP) | 2010-05-04 | — | — | US | disclosed |
| US-20080124524-A1 | Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern | JSR CORPORATION (JP) | 2008-05-29 | — | — | US | disclosed |
| US-20080038661-A1 | Copolymer and Top Coating Composition | JSR CORPORATION (JP) | 2008-02-14 | — | — | US | disclosed |
| CN-101080674-A | Composition for forming antireflection film, layered product, and method for forming resist pattern | JSR CORP (JP) | 2007-11-28 | — | — | CN | disclosed |
| US-20070269734-A1 | Uper Layer Film Forming Composition for Liquid Immersion and Method of Forming Photoresist Pattern | JSR CORPORATION (JP) | 2007-11-22 | — | — | US | disclosed |
| EP-1818723-A1 | COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN | JSR Corporation (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1806370-A1 | COPOLYMER AND UPPER FILM-FORMING COMPOSITION | JSR Corporation (JP) | 2007-07-11 | — | — | EP | disclosed |
| EP-1708027-A1 | UPPER LAYER FILM FORMING COMPOSITION FOR LIQUID IMMERSION AND METHOD OF FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2006-10-04 | — | — | EP | disclosed |