SCHEMBL91140

SCHEMBL91140

OC(C1CCCCC1)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
PDK1 Q15118 1/20 0.36
PDK2 Q15119 1/20 0.36
PDK3 Q15120 1/20 0.36
PDK4 Q16654 1/20 0.36
NR1H2 P55055 1/20 0.32
NR1H3 Q13133 1/20 0.32
AR P10275 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13917609 0.97 PDK1 (0.33) PDK1PDK2PDK3PDK4AR
SCHEMBL133236 0.85 LIPA (0.30)
SCHEMBL5846400 0.81 AR (0.31) AR
SCHEMBL14527538 0.81 AR (0.31) AR
SCHEMBL6812488 0.78
SCHEMBL12096882 0.78 PDK1 (0.36) PDK1PDK2PDK3PDK4NR1H2
SCHEMBL2497987 0.77 PDK1 (0.39) PDK1PDK2PDK3PDK4NR1H2
SCHEMBL15134101 0.76 TSHR (0.32)
SCHEMBL10212934 0.76 TSHR (0.32)
SCHEMBL6811846 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11785845-B2 Composition FUJIFILM CORPORATION (JP) 2023-10-10 US disclosed
US-20220045283-A1 COMPOSITION FUJIFILM CORPORATION (JP) 2022-02-10 US disclosed
US-10792711-B2 Substrate processing system, substrate cleaning method, and recording medium TOKYO ELECTRON LIMITED (JP) 2020-10-06 US disclosed
US-10272478-B2 Substrate processing system, substrate cleaning method, and recording medium TOKYO ELECTRON LIMITED (JP) 2019-04-30 US disclosed
US-20190118227-A1 SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDING MEDIUM TOKYO ELECTRON LIMITED (JP) 2019-04-25 US disclosed
US-9818598-B2 Substrate cleaning method and recording medium TOKYO ELECTRON LIMITED (JP) 2017-11-14 US disclosed
EP-3205652-A1 HYDROXYL PURINE COMPOUNDS AND APPLICATIONS THEREOF Medshine Discovery Inc. (CN) 2017-08-16 EP disclosed
WO-2017071606-A1 MEDICAL USE OF HYDROXYL PURINE COMPOUND 南京明德新药研发股份有限公司 2017-05-04 WO disclosed
US-20160035564-A1 SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM JICC-02 CORPORATION (JP) 2016-02-04 US disclosed
US-20160035561-A1 SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDING MEDIUM TOKYO ELECTRON LIMITED (JP) 2016-02-04 US disclosed
US-20070099113-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
US-20070099113-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
US-20070099112-A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-05-03 US disclosed
EP-1780199-A1 Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-02 EP disclosed
EP-1780198-A1 Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-05-02 EP disclosed
US-7157206-B2 Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
US-7157206-B2 Resin containing an acid-decomposable group such as bis(trifluoromethyl)methanol group, to generate alkali-soluble group, and acid generators selected from fluorine-substituted or non-fluorine substituted aromatic or aliphatic carboxylic acid generators or sulfonic acid generators; microlithography FUJI PHOTO FILM CO., LTD. (JP) 2007-01-02 US disclosed
EP-0286991-B1 PROCESS FOR PREPARING FLUORINE-SUBSTITUTED ALICYCLIC DIOLS DAIKIN INDUSTRIES, LIMITED (JP) 1993-08-18 EP disclosed
US-4873375-A Process for preparing fluorine-substituted alicyclic diol DAIKIN INDUSTRIES, LTD. (JP) 1989-10-10 US disclosed
EP-0286991-A2 Process for preparing fluorine-substituted alicyclic diols DAIKIN INDUSTRIES, LIMITED (JP) 1988-10-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20220045283-A1 COMPOSITION ADH1A, ADH1C, SLC19A2 PDK1 1730/4885PDK2 2907/4885PDK3 3068/4885
US-11785845-B2 Composition ADH1A, ADH1C, SLC19A2 PDK1 1730/4885PDK2 2907/4885PDK3 3068/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.