SCHEMBL914573

SCHEMBL914573

O=P(O)(O)Cc1ccccc1OCCO

nearest known ligand 0.55

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ACP3 P15309 1/20 0.46
NPC1 O15118 2/20 0.45
POLB P06746 2/20 0.45
PTK2B Q14289 1/20 0.45
ALDH1A1 P00352 3/20 0.44
RAB9A P51151 1/20 0.44
MMP2 P08253 2/20 0.43
MMP9 P14780 2/20 0.43
MMP12 P39900 2/20 0.43
L3MBTL1 Q9Y468 2/20 0.42
GAA P10253 1/20 0.42
MAPT P10636 1/20 0.42
NPSR1 Q6W5P4 1/20 0.42
RECQL P46063 1/20 0.41
IDO1 P14902 1/20 0.41
PNP P00491 1/20 0.40
HTT P42858 1/20 0.39
MCHR1 Q99705 1/20 0.39
BRD4 O60885 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27727424 0.85 L3MBTL1 (0.49) ACP3NPC1POLBPTK2BALDH1A1
SCHEMBL914709 0.83 ALDH1A1 (0.49) NPC1POLBPTK2BALDH1A1RAB9A
SCHEMBL915337 0.81 IDO1 (0.55) ACP3NPC1POLBPTK2BALDH1A1
SCHEMBL916788 0.80 L3MBTL1 (0.47) NPC1POLBPTK2BALDH1A1L3MBTL1
SCHEMBL915314 0.79 INPPL1 (0.47) ALDH1A1MMP2MMP9MMP12GAA
SCHEMBL5147221 0.78 L3MBTL1 (0.67) ALDH1A1L3MBTL1MAPTNPSR1RECQL
SCHEMBL7873203 0.77 IDO1 (0.53) ALDH1A1RAB9AL3MBTL1GAAMAPT
SCHEMBL15510160 0.77 ALDH1A1 (0.50) ALDH1A1L3MBTL1GAAMAPTNPSR1
SCHEMBL29386728 0.77 ALDH1A1 (0.50) ALDH1A1L3MBTL1GAAMAPTNPSR1
SCHEMBL916790 0.77 L3MBTL1 (0.39) NPC1POLBPTK2BALDH1A1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed