SCHEMBL914709

SCHEMBL914709

CCOP(=O)(O)Cc1ccccc1OCCO

nearest known ligand 0.49

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.49
L3MBTL1 Q9Y468 6/20 0.47
MAPT P10636 2/20 0.47
NPSR1 Q6W5P4 1/20 0.47
PPARD Q03181 1/20 0.42
NPC1 O15118 2/20 0.40
POLB P06746 2/20 0.40
PTK2B Q14289 1/20 0.40
HPGD P15428 1/20 0.39
ATM Q13315 1/20 0.39
RAB9A P51151 1/20 0.39
HTT P42858 1/20 0.38
BRD4 O60885 1/20 0.37
KDM4E B2RXH2 2/20 0.37
HIF1A Q16665 1/20 0.36
IDO1 P14902 1/20 0.36
RECQL P46063 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916788 0.88 L3MBTL1 (0.47) ALDH1A1L3MBTL1MAPTNPSR1PPARD
SCHEMBL914962 0.88 ALDH1A1 (0.52) ALDH1A1L3MBTL1MAPTNPSR1PPARD
SCHEMBL914699 0.83 IDO1 (0.49) ALDH1A1MAPTNPSR1PPARDHPGD
SCHEMBL914573 0.83 ACP3 (0.46) ALDH1A1L3MBTL1MAPTNPSR1NPC1
SCHEMBL916790 0.82 L3MBTL1 (0.39) ALDH1A1L3MBTL1MAPTNPSR1NPC1
SCHEMBL915784 0.82 INPPL1 (0.42) ALDH1A1L3MBTL1MAPTPPARDPOLB
SCHEMBL5147221 0.79 L3MBTL1 (0.67) ALDH1A1L3MBTL1MAPTNPSR1PPARD
SCHEMBL916335 0.77 KMT2A (0.44) ALDH1A1L3MBTL1NPSR1PPARDPOLB
SCHEMBL915413 0.76 ALDH1A1 (0.40) ALDH1A1L3MBTL1HPGDKDM4EIDO1
SCHEMBL914480 0.75 L3MBTL1 (0.53) ALDH1A1L3MBTL1MAPTNPSR1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed