SCHEMBL914870

SCHEMBL914870

O=P(O)(O)Cc1c2ccccc2cc2ccccc12

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACP3 P15309 2/20 0.56
HTR2A P28223 1/20 0.50
L3MBTL1 Q9Y468 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.47
PGK1 P00558 3/20 0.44
PGK2 P07205 3/20 0.44
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 1/20 0.44
ALDH1A1 P00352 1/20 0.44
CYP1A2 P05177 1/20 0.44
GLA P06280 1/20 0.44
HPGD P15428 1/20 0.44
CYP2C19 P33261 1/20 0.44
HSD17B10 Q99714 1/20 0.44
GPR35 Q9HC97 2/20 0.42
POLB P06746 1/20 0.42
GPR84 Q9NQS5 1/20 0.42
PTPN1 P18031 1/20 0.41
NR1I2 O75469 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3421056 0.85 SMN1; SMN2 (0.56) ACP3SMN1; SMN2PGK1PGK2MEN1
SCHEMBL7619989 0.83 ACP3 (0.47) ACP3HTR2AL3MBTL1SMN1; SMN2PGK1
SCHEMBL916722 0.79 HSD17B10 (0.61) ACP3MEN1KMT2AKDM4EALDH1A1
SCHEMBL17029074 0.79 ACP3 (0.66) ACP3L3MBTL1SMN1; SMN2PGK1PGK2
SCHEMBL914661 0.79 NR1I2 (0.55) ACP3HTR2AL3MBTL1MEN1KMT2A
SCHEMBL8824574 0.78 ACP3 (0.54) ACP3SMN1; SMN2PGK1PGK2KMT2A
SCHEMBL11491572 0.77 ACP3 (0.62) ACP3PGK1PGK2ALDH1A1CYP1A2
SCHEMBL8824524 0.76 HTR2A (0.46) ACP3HTR2AL3MBTL1MEN1KMT2A
SCHEMBL916426 0.75 WDR5 (0.54) ACP3MEN1KMT2AKDM4EALDH1A1
SCHEMBL916643 0.73 NR1I2 (0.52) HTR2AL3MBTL1MEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-54151955-A None JP disclosed
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
EP-2484714-B1 POLYESTER FILM FOR PROTECTION OF BACK SURFACES OF SOLAR CELLS TOYO BOSEKI (JP) 2018-05-02 EP disclosed
US-9640689-B2 Polyester film for the protection of back surfaces of solar cells TOYO BOSEKI KABUSHIKI KAISHA (JP) 2017-05-02 US disclosed
EP-2484714-A1 POLYESTER FILM FOR PROTECTION OF BACK SURFACES OF SOLAR CELLS Toyo Boseki Kabushiki Kaisha (JP) 2012-08-08 EP disclosed
US-20120183761-A1 POLYESTER FILM FOR THE PROTECTION OF BACK SURFACES OF SOLAR CELLS TOYO BOSEKI KABUSHIKI KAISHA (JP) 2012-07-19 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090297752-A1 POLYESTER RESIN, POLYESTER RESIN COMPOSITION THEREFROM AND USE THEREOF TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-12-03 US disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed
US-20070106055-A1 Polyester polymerization catalyst, polyester produced therewith and process for producing the polyester TOYO BOSEKI KABUSHIKI KAISHA (JP) 2007-05-10 US disclosed
US-20070065649-A1 Polyester resin TOYO BOSEKI KAUSHIKI KAISHA (JP) 2007-03-22 US disclosed
EP-1719790-A1 POLYESTER POLYMERIZATION CATALYST, POLYESTER PRODUCED THEREWITH AND PROCESS FOR PRODUCING THE POLYESTER Toyo Boseki Kabushiki Kaisha (JP) 2006-11-08 EP disclosed
JP-S54151955-A PRODUCTION OF 9-STYRYLANTHRACENE AND RELATIVE COMPOUNDS RICOH CO LTD 1979-11-29 JP disclosed
US-4091208-A ELECTROGRAPHY, PHOTOSENSITIVITY RICOH CO., LTD. (JA) 1978-05-23 US disclosed