SCHEMBL914873

SCHEMBL914873

CCOP(=O)(O)Cc1cccc(C(=O)OC)c1

nearest known ligand 0.57

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 1/20 0.57
CYP4F2 P78329 3/20 0.56
CYP4A11 Q02928 3/20 0.56
SLC7A5 Q01650 1/20 0.50
MRGPRX4 Q96LA9 2/20 0.47
RAB9A P51151 3/20 0.46
SMN1; SMN2 Q16637 2/20 0.46
ALDH1A1 P00352 2/20 0.46
KDM4E B2RXH2 1/20 0.46
MAPT P10636 1/20 0.46
ABHD6 Q9BV23 1/20 0.45
HIF1A Q16665 1/20 0.45
HTT P42858 1/20 0.45
TSHR P16473 1/20 0.44
FOLH1 Q04609 1/20 0.44
HPGD P15428 1/20 0.44
CD74 P04233 1/20 0.44
MIF P14174 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL498351 0.89 LOXL2 (0.57) LOXL2CYP4F2CYP4A11SLC7A5MRGPRX4
SCHEMBL916101 0.85 MRGPRX4 (0.54) MRGPRX4RAB9ASMN1; SMN2FOLH1
SCHEMBL915746 0.85 KDM4E (0.46) LOXL2CYP4F2CYP4A11SLC7A5ALDH1A1
SCHEMBL915149 0.85 LOXL2 (0.64) LOXL2CYP4F2CYP4A11SLC7A5MRGPRX4
SCHEMBL915374 0.83 LOXL2 (0.51) LOXL2CYP4F2CYP4A11SLC7A5MRGPRX4
SCHEMBL915436 0.82 LOXL2 (0.53) LOXL2CYP4F2CYP4A11RAB9ASMN1; SMN2
SCHEMBL3475567 0.81 LOXL2 (0.62) LOXL2CYP4F2CYP4A11SLC7A5MRGPRX4
SCHEMBL126284 0.80 LOXL2 (0.74) LOXL2CYP4F2CYP4A11SLC7A5MRGPRX4
SCHEMBL916358 0.78 LOXL2 (0.49) LOXL2CYP4F2CYP4A11RAB9ASMN1; SMN2
SCHEMBL915650 0.78 LOXL2 (0.49) LOXL2CYP4F2CYP4A11RAB9ASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed