SCHEMBL916101

SCHEMBL916101

CCOP(=O)(O)Cc1cccc(C(=O)O)c1

nearest known ligand 0.54

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
MRGPRX4 Q96LA9 9/20 0.54
TP53 P04637 2/20 0.54
PKM P14618 2/20 0.54
NFKB1 P19838 2/20 0.54
NFKB2 Q00653 2/20 0.54
RELA Q04206 2/20 0.54
SMN1; SMN2 Q16637 2/20 0.54
FOLH1 Q04609 2/20 0.50
RAB9A P51151 1/20 0.47
RXFP1 Q9HBX9 1/20 0.47
KMT2A Q03164 1/20 0.44
NR4A2 P43354 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915153 0.88 MRGPRX4 (0.54) MRGPRX4TP53PKMNFKB1NFKB2
SCHEMBL914873 0.85 LOXL2 (0.57) MRGPRX4SMN1; SMN2FOLH1RAB9A
SCHEMBL915468 0.84 PPARD (0.40) MRGPRX4TP53PKMNFKB1NFKB2
SCHEMBL915155 0.82 FOLH1 (0.47) MRGPRX4TP53PKMNFKB1NFKB2
SCHEMBL915443 0.81 ALDH1A1 (0.53) TP53SMN1; SMN2RAB9AKMT2A
SCHEMBL914724 0.80 FOLH1 (0.60) FOLH1
SCHEMBL915800 0.80 TSHR (0.52) KMT2A
SCHEMBL8959089 0.80 IDO1 (0.43) SMN1; SMN2KMT2A
SCHEMBL27740956 0.79 MRGPRX4 (0.51) MRGPRX4TP53PKMNFKB1NFKB2
Phosphoric Acid SCHEMBL8605342 0.79 CETP (0.50) KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed