SCHEMBL915374

SCHEMBL915374

CCC(C)OP(=O)(O)Cc1cccc(C(=O)OC)c1

nearest known ligand 0.51

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
LOXL2 Q9Y4K0 1/20 0.51
CYP4F2 P78329 2/20 0.50
CYP4A11 Q02928 2/20 0.50
SLC7A5 Q01650 1/20 0.48
FOLH1 Q04609 1/20 0.43
MRGPRX4 Q96LA9 2/20 0.43
RAB9A P51151 3/20 0.42
SMN1; SMN2 Q16637 2/20 0.42
ALDH1A1 P00352 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MAPT P10636 1/20 0.42
ABHD6 Q9BV23 1/20 0.41
HIF1A Q16665 1/20 0.41
IDO1 P14902 1/20 0.41
HTT P42858 1/20 0.41
TSHR P16473 1/20 0.41
CD74 P04233 1/20 0.40
MIF P14174 1/20 0.40
HPGD P15428 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915155 0.87 FOLH1 (0.47) FOLH1MRGPRX4RAB9ASMN1; SMN2
SCHEMBL915656 0.87 HSD17B10 (0.46) LOXL2CYP4F2CYP4A11SLC7A5ALDH1A1
SCHEMBL915305 0.84 LOXL2 (0.46) LOXL2CYP4F2CYP4A11RAB9ASMN1; SMN2
SCHEMBL914873 0.83 LOXL2 (0.57) LOXL2CYP4F2CYP4A11SLC7A5FOLH1
SCHEMBL915113 0.81 LOXL2 (0.43) LOXL2CYP4F2CYP4A11RAB9ASMN1; SMN2
SCHEMBL915149 0.80 LOXL2 (0.64) LOXL2CYP4F2CYP4A11SLC7A5FOLH1
SCHEMBL1759926 0.79 PGK1 (0.38) RAB9ASMN1; SMN2HIF1AIDO1
SCHEMBL1307263 0.79 PGK1 (0.38) ALDH1A1KDM4EMAPTIDO1HPGD
SCHEMBL914653 0.79 KDM4E (0.48) SMN1; SMN2ALDH1A1KDM4EMAPTTSHR
SCHEMBL1407856 0.78 TRPA1 (0.42) FOLH1TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed