Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.47 |
| ▸ | CA3 | P07451 | 3/20 | 0.47 |
| ▸ | CA14 | Q9ULX7 | 3/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | CA12 | O43570 | 2/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.47 |
| ▸ | CA2 | P00918 | 2/20 | 0.47 |
| ▸ | TYR | P14679 | 2/20 | 0.47 |
| ▸ | CA4 | P22748 | 2/20 | 0.47 |
| ▸ | CA5A | P35218 | 2/20 | 0.47 |
| ▸ | CA9 | Q16790 | 2/20 | 0.47 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.47 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL916573 | 0.92 | ESR1 (0.55) | LMNACA3CA14ALOX15MAPT | |
| SCHEMBL21112089 | 0.87 | — | — | |
| Phenol SCHEMBL27597730 | 0.81 | CA12 (0.55) | LMNACA3CA14ALOX15MAPT | |
| Hydroquinone SCHEMBL9580349 | 0.81 | LMNA (0.61) | LMNACA3CA14ALOX15MAPT | |
| SCHEMBL917051 | 0.79 | LMNA (0.50) | LMNACA3CA14ALOX15MAPT | |
| SCHEMBL7705345 | 0.79 | ESR1 (0.35) | ESR1ESR2 | |
| SCHEMBL7205093 | 0.74 | MAPT (0.44) | LMNACA3CA14ALOX15MAPT | |
| SCHEMBL230854 | 0.74 | TDP1 (0.44) | LMNAHPGDCA2ALDH1A1MEN1 | |
| SCHEMBL15304564 | 0.74 | LMNA (0.44) | LMNAALOX15CA1CA2ALDH1A1 | |
| SCHEMBL313210 | 0.74 | CES2 (0.42) | CA1CA2CA9ALDH1A1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 152 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5633111-A | Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound | FUJI PHOTO FILM CO., LTD. (JP) | 1997-05-27 | — | — | US | claimed |
| US-5254430-A | Lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-19 | — | — | US | claimed |
| US-5230988-A | Image exposure of plates of aluminum with phosphate or phosphonate compounds and basic compounds | FUJI PHOTO FILM CO., LTD. (JP) | 1993-07-27 | — | — | US | claimed |
| US-20260092155-A1 | METHOD FOR PRODUCING POLYESTER FILM USING POLYESTER RESIN DERIVED FROM BIOMASS RESOURCES, AND POLYESTER FILM | TOYOBO CO., LTD. (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12570795-B2 | Polyester resin and method for producing blow-molded product made of polyester resin | TOYOBO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-20260048540-A1 | METHOD FOR PRODUCING POLYESTER FILM AND POLYESTER FILM USING RECOVERED POLYESTER RESIN | TOYOBO CO., LTD. (JP) | 2026-02-19 | — | — | US | disclosed |
| EP-4663685-A1 | METHOD FOR PRODUCING COPOLYMER POLYESTER RESIN | TOYOBO MC Corporation (JP) | 2025-12-17 | — | — | EP | disclosed |
| US-20250298333-A1 | POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD | Konica Minolta, Inc. (JP) | 2025-09-25 | — | — | US | disclosed |
| US-20250297096-A1 | METHOD FOR PRODUCING POLYESTER FILM USING RECYCLED POLYESTER RESIN, AND POLYESTER FILM | TOYOBO CO., LTD (JP) | 2025-09-25 | — | — | US | disclosed |
| US-12384893-B2 | Biaxially oriented polyester film | TOYOBO CO., LTD. (JP) | 2025-08-12 | — | — | US | disclosed |
| EP-4596601-A1 | CO-POLYESTER RESIN | TOYOBO MC Corporation (JP) | 2025-08-06 | — | — | EP | disclosed |
| EP-0497351-B1 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1997-04-23 | — | — | EP | disclosed |
| EP-0540032-B1 | Photoresist composition and etching method | FUJI PHOTO FILM CO LTD (JP) | 1996-03-06 | — | — | EP | disclosed |
| EP-0503602-B1 | Method of making lithographic printing plate | FUJI PHOTO FILM CO LTD (JP) | 1995-06-14 | — | — | EP | disclosed |
| US-5254430-A | Lithographic printing plates | FUJI PHOTO FILM CO., LTD. (JP) | 1993-10-19 | — | — | US | disclosed |
| US-5230988-A | Image exposure of plates of aluminum with phosphate or phosphonate compounds and basic compounds | FUJI PHOTO FILM CO., LTD. (JP) | 1993-07-27 | — | — | US | disclosed |
| EP-0540032-A1 | Photoresist composition and etching method | FUJI PHOTO FILM CO., LTD. (JP) | 1993-05-05 | — | — | EP | disclosed |
| EP-0503602-A1 | Method of making lithographic printing plate | Fuji Photo Film Co., Ltd. (JP) | 1992-09-16 | — | — | EP | disclosed |
| EP-0497351-A1 | Presensitized plate for use in making lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 1992-08-05 | — | — | EP | disclosed |
| EP-0487343-A1 | Process for preparing a lithographic plate | Fuji Photo Film Co., Ltd. (JP) | 1992-05-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260092155-A1 | METHOD FOR PRODUCING POLYESTER FILM USING POLYESTER RESIN DERIVED FROM BIOMASS RESOURCES, AND POLYESTER FILM | PARG, TERB1, POT1 | LMNA 3619/4885CA3 2232/4885CA14 2880/4885 |
| US-20260048540-A1 | METHOD FOR PRODUCING POLYESTER FILM AND POLYESTER FILM USING RECOVERED POLYESTER RESIN | PUF60, RER1, EXOSC9 | LMNA 2910/4885CA3 2092/4885CA14 1913/4885 |
| US-12570795-B2 | Polyester resin and method for producing blow-molded product made of polyester resin | BZW1, BZW2, TAF1 | LMNA 2832/4885CA3 443/4885CA14 2439/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.