SCHEMBL915100

SCHEMBL915100

CCOP(=O)(O)Cc1ccc(S(=O)(=O)c2ccc(C(=O)OC)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
POLB P06746 3/20 0.50
CA12 O43570 4/20 0.47
CA1 P00915 4/20 0.47
CA2 P00918 4/20 0.47
CA9 Q16790 3/20 0.47
CA14 Q9ULX7 3/20 0.47
LOXL2 Q9Y4K0 1/20 0.44
HPGD P15428 1/20 0.43
GLA P06280 1/20 0.43
MAPT P10636 1/20 0.42
FBP1 P09467 1/20 0.42
CYP4A11 Q02928 2/20 0.41
ALDH1A1 P00352 1/20 0.41
KMT2A Q03164 2/20 0.41
HDAC1 Q13547 1/20 0.41
CYP4F2 P78329 1/20 0.40
CA7 P43166 1/20 0.40
GAA P10253 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915436 0.90 LOXL2 (0.53) CA12CA1CA2CA9CA14
SCHEMBL915500 0.86 ALDH1A1 (0.44) POLBCA12CA1CA2CA9
SCHEMBL914874 0.86 POLB (0.55) POLBCA12CA1CA2CA9
SCHEMBL916358 0.86 LOXL2 (0.49) CA12CA1CA2CA9CA14
SCHEMBL914830 0.86 LOXL2 (0.49) CA12CA1CA2CA9CA14
SCHEMBL915650 0.86 LOXL2 (0.49) CA12CA1CA2CA9CA14
SCHEMBL916261 0.84 MAPT (0.47) CA1CA2LOXL2HPGDGLA
SCHEMBL915321 0.83 LOXL2 (0.45) CA12CA1CA2CA9CA14
SCHEMBL915303 0.82 GAA (0.46) POLBCA12CA1CA2CA9
SCHEMBL914204 0.82 CA1 (0.47) POLBCA12CA1CA2CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed