SCHEMBL915303

SCHEMBL915303

CCOP(=O)(O)Cc1ccc(S(=O)(=O)c2ccc(O)cc2)cc1

nearest known ligand 0.46

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.46
PKM P14618 1/20 0.46
ELANE P08246 2/20 0.41
KMT2A Q03164 1/20 0.41
ESR1 P03372 3/20 0.40
MMP1 P03956 1/20 0.39
ENPP2 Q13822 1/20 0.38
RAPGEF4 Q8WZA2 1/20 0.37
POLB P06746 1/20 0.37
NPSR1 Q6W5P4 1/20 0.37
PPARD Q03181 1/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
PTPN1 P18031 1/20 0.36
LMNA P02545 1/20 0.35
HDAC1 Q13547 1/20 0.35
CA12 O43570 1/20 0.34
CA9 Q16790 1/20 0.34
ATM Q13315 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915441 0.89 PPARD (0.44) KMT2AESR1ENPP2POLBPPARD
SCHEMBL916528 0.88 GAA (0.46) GAAPKMELANEKMT2AESR1
Butane SCHEMBL27659367 0.85 POLB (0.41) KMT2AESR1ENPP2POLBPPARD
SCHEMBL916015 0.84 ENPP2 (0.50) ENPP2CA1CA2LMNACA12
SCHEMBL915500 0.84 ALDH1A1 (0.44) KMT2APOLBCA1CA2HDAC1
SCHEMBL915108 0.84 HDAC1 (0.42) ESR1ENPP2POLBPPARDCA1
SCHEMBL915285 0.84 PTPN1 (0.50) ELANEKMT2AESR1ENPP2POLB
SCHEMBL4440816 0.83 GAA (0.46) GAAPKMKMT2AMMP1POLB
SCHEMBL6182058 0.83 ENPP2 (0.41) ENPP2POLBPPARDPTPN1HDAC1
SCHEMBL915100 0.82 POLB (0.50) GAAKMT2APOLBCA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed