SCHEMBL916261

SCHEMBL916261

CCOP(=O)(O)Cc1ccc(Oc2ccc(C(=O)OC)cc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 5/20 0.47
RAB9A P51151 5/20 0.47
NPC1 O15118 4/20 0.47
SMN1; SMN2 Q16637 3/20 0.47
KMT2A Q03164 2/20 0.47
MEN1 O00255 1/20 0.47
LOXL2 Q9Y4K0 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CYP4A11 Q02928 2/20 0.43
CYP4F2 P78329 1/20 0.42
HDAC1 Q13547 1/20 0.42
HPGD P15428 1/20 0.41
TSHR P16473 1/20 0.41
HTT P42858 1/20 0.41
TP53 P04637 1/20 0.41
GLA P06280 1/20 0.41
MAPK1 P28482 1/20 0.41
LPAR1 Q92633 1/20 0.41
LPAR5 Q9H1C0 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915436 0.93 LOXL2 (0.53) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL915650 0.89 LOXL2 (0.49) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL916358 0.89 LOXL2 (0.49) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL914830 0.89 LOXL2 (0.49) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL915339 0.86 SRD5A2 (0.53) RAB9ANPC1SMN1; SMN2CA1CA2
SCHEMBL915428 0.85 MAPT (0.51) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL915321 0.85 LOXL2 (0.45) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL915100 0.84 POLB (0.50) MAPTKMT2ALOXL2CA1CA2
SCHEMBL914204 0.84 CA1 (0.47) MAPTRAB9ANPC1SMN1; SMN2KMT2A
SCHEMBL914831 0.81 LTA4H (0.51) SMN1; SMN2KMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed