SCHEMBL915165

SCHEMBL915165

CCC(C)OP(=O)(O)Cc1ccc(O)cc1

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.38
ESR2 Q92731 3/20 0.38
PTPN1 P18031 1/20 0.37
TAAR1 Q96RJ0 3/20 0.37
SLC6A2 P23975 2/20 0.37
PGK1 P00558 2/20 0.37
PGK2 P07205 2/20 0.37
MME P08473 1/20 0.35
ACE P12821 1/20 0.35
CPA1 P15085 1/20 0.35
ACE2 Q9BYF1 1/20 0.35
LMNA P02545 1/20 0.35
CYP1A2 P05177 1/20 0.35
PGR P06401 1/20 0.35
CHRM2 P08172 1/20 0.35
CYP3A4 P08684 1/20 0.35
ADORA3 P0DMS8 1/20 0.35
AR P10275 1/20 0.35
CYP2D6 P10635 1/20 0.35
MAPT P10636 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915423 0.95 MMP1 (0.36) ESR1ESR2PTPN1TAAR1SLC6A2
SCHEMBL915631 0.95 PTPN1 (0.44) ESR1ESR2PTPN1TAAR1SLC6A2
SCHEMBL915404 0.93 LTA4H (0.41) ESR1ESR2PTPN1MMEACE
SCHEMBL914847 0.92 ESR1 (0.41) ESR1ESR2SLC6A2LMNAMAPT
SCHEMBL915688 0.92 NR1H2 (0.38) ESR1ESR2PTPN1TAAR1SLC6A2
SCHEMBL916530 0.90 GAA (0.41) ESR1ESR2PTPN1LMNAENPP2
SCHEMBL916543 0.90 ESR1 (0.42) ESR1ESR2SLC6A2PGK1PGK2
SCHEMBL915243 0.87 PGK1 (0.37) PGK1PGK2LMNACYP2C19ENPP2
SCHEMBL1334895 0.86 FPR2 (0.38) PGK1PGK2LMNACYP3A4CYP2C9
SCHEMBL917066 0.86 HTT (0.37) SLC6A2PGK1PGK2CYP1A2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed