SCHEMBL915190

SCHEMBL915190

CCC(C)OP(=O)(O)Cc1ccccc1C(=O)O

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FOLH1 Q04609 2/20 0.40
ALDH1A1 P00352 5/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
KDM4E B2RXH2 4/20 0.39
HPGD P15428 2/20 0.39
HSD17B10 Q99714 2/20 0.39
USP2 O75604 1/20 0.39
PDE3A Q14432 1/20 0.39
MAPK8 P45983 1/20 0.38
TDP1 Q9NUW8 2/20 0.38
TSHR P16473 3/20 0.38
CLCN2 P51788 1/20 0.38
POLB P06746 1/20 0.38
CYP2C9 P11712 1/20 0.37
HIF1A Q16665 1/20 0.37
HTT P42858 2/20 0.37
RECQL P46063 1/20 0.37
TP53 P04637 1/20 0.37
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914624 0.86 ALDH1A1 (0.46) ALDH1A1MEN1KMT2AKDM4EHSD17B10
SCHEMBL913959 0.84 ACE2 (0.39) ALDH1A1KDM4ETDP1TSHRLMNA
SCHEMBL916315 0.82 TSHR (0.49) MEN1KMT2ATSHRPOLBHIF1A
SCHEMBL916701 0.81 KDM4E (0.36) ALDH1A1KDM4EHPGDTSHRHTT
SCHEMBL915524 0.81 FOLH1 (0.45) FOLH1ALDH1A1KDM4EHPGDHSD17B10
SCHEMBL3086597 0.80 IDO1 (0.34) ALDH1A1KMT2AKDM4ETDP1TSHR
SCHEMBL2008230 0.80 EPHX2 (0.36) KDM4EHPGDTSHR
SCHEMBL642703 0.80 FDPS (0.42) ALDH1A1KDM4EHPGDHSD17B10TDP1
SCHEMBL901668 0.80 ALDH1A1 (0.44) ALDH1A1MEN1KMT2AHPGDTSHR
SCHEMBL1407856 0.79 TRPA1 (0.42) FOLH1MEN1KMT2AHPGDTSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed