SCHEMBL915259

SCHEMBL915259

O=P(O)(O)Cc1ccc(OCCO)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
RECQL P46063 1/20 0.48
GAA P10253 1/20 0.46
PGK1 P00558 4/20 0.46
PGK2 P07205 4/20 0.46
PTPN1 P18031 2/20 0.45
NR1I2 O75469 1/20 0.44
ENPP2 Q13822 1/20 0.42
CYP3A4 P08684 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.41
THRA P10827 1/20 0.41
THRB P10828 1/20 0.41
S1PR2 O95136 2/20 0.40
S1PR1 P21453 2/20 0.40
S1PR3 Q99500 2/20 0.40
LPAR2 Q9HBW0 2/20 0.40
MEN1 O00255 1/20 0.40
USP2 O75604 1/20 0.40
LMNA P02545 1/20 0.40
MAPK1 P28482 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL916009 0.96 ALDH1A1 (0.46) ALDH1A1RECQLGAAPGK1PGK2
SCHEMBL915318 0.95 PTPN1 (0.53) ALDH1A1RECQLGAAPGK1PGK2
SCHEMBL916704 0.95 ALDH1A1 (0.44) ALDH1A1RECQLGAAPGK1PGK2
SCHEMBL914970 0.91 MMP2 (0.42) ALDH1A1RECQLGAAPGK1PGK2
SCHEMBL915136 0.91 GAA (0.62) ALDH1A1RECQLGAANR1I2SMN1; SMN2
SCHEMBL914795 0.89 ALDH1A1 (0.44) ALDH1A1RECQLGAAPGK1PGK2
SCHEMBL915129 0.88 SMN1; SMN2 (0.50) ALDH1A1PGK1PGK2PTPN1NR1I2
SCHEMBL915764 0.84 ENPP2 (0.45) PGK1PGK2PTPN1ENPP2S1PR2
SCHEMBL915416 0.83 CHEK2 (0.42) PGK1PGK2PTPN1ENPP2S1PR2
SCHEMBL914815 0.82 NR1I2 (0.46) ALDH1A1RECQLGAANR1I2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed