SCHEMBL915416

SCHEMBL915416

COCCOc1ccc(-c2ccc(CP(=O)(O)O)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CHEK2 O96017 1/20 0.42
ACACB O00763 1/20 0.42
PPARG P37231 1/20 0.42
PPARD Q03181 1/20 0.42
PPARA Q07869 1/20 0.42
ENPP2 Q13822 1/20 0.41
PGK1 P00558 3/20 0.41
PGK2 P07205 3/20 0.41
MAPT P10636 1/20 0.41
MMP2 P08253 3/20 0.41
MMP9 P14780 3/20 0.41
MMP12 P39900 2/20 0.41
S1PR1 P21453 3/20 0.41
PTPN1 P18031 1/20 0.41
MMP13 P45452 1/20 0.40
S1PR2 O95136 2/20 0.40
S1PR3 Q99500 2/20 0.40
LPAR2 Q9HBW0 2/20 0.40
EIF4E P06730 1/20 0.40
CHEK1 O14757 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915764 0.95 ENPP2 (0.45) ACACBENPP2PGK1PGK2MAPT
SCHEMBL31187555 0.90 KDM4E (0.45) ACACBENPP2PGK1PGK2MAPT
SCHEMBL915789 0.90 PTPN1 (0.51) ACACBENPP2PGK1PGK2MAPT
SCHEMBL915653 0.90 CYP1A2 (0.43) ACACBPPARGPPARDPPARAENPP2
SCHEMBL916009 0.87 ALDH1A1 (0.46) ENPP2PGK1PGK2MMP2MMP9
SCHEMBL915289 0.86 MMP2 (0.44) ACACBENPP2PGK1PGK2MAPT
SCHEMBL915544 0.86 MAPT (0.49) ACACBPPARGPPARDPPARAMAPT
SCHEMBL914836 0.85 S1PR1 (0.43) CHEK2ACACBPPARGPPARDPPARA
SCHEMBL916971 0.85 KDM4E (0.48) PPARGPGK1PGK2MAPTS1PR1
SCHEMBL915316 0.85 MMP2 (0.45) ACACBMAPTMMP2MMP9MMP12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed