SCHEMBL915465

SCHEMBL915465

CCCCc1ccc(C(C)(C)c2ccc(CP(=O)(O)OCC)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 1/20 0.50
S1PR1 P21453 9/20 0.44
S1PR3 Q99500 9/20 0.44
PLK1 P53350 1/20 0.43
PTPN2 P17706 1/20 0.41
PTPN1 P18031 1/20 0.41
PTPN6 P29350 1/20 0.41
PTPN11 Q06124 1/20 0.41
S1PR4 O95977 7/20 0.41
S1PR5 Q9H228 5/20 0.41
S1PR2 O95136 4/20 0.41
HPGD P15428 3/20 0.40
ALDH1A1 P00352 2/20 0.40
HSD17B10 Q99714 1/20 0.40
TRPV1 Q8NER1 1/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914660 0.90 ENPP2 (0.60) ENPP2S1PR1S1PR3PLK1S1PR4
SCHEMBL914858 0.85 ENPP2 (0.69) ENPP2S1PR1S1PR3PLK1PTPN2
SCHEMBL917185 0.85 ENPP2 (0.55) ENPP2S1PR1S1PR3PLK1S1PR4
SCHEMBL915295 0.85 ENPP2 (0.55) ENPP2S1PR1S1PR3PLK1S1PR4
SCHEMBL915993 0.84 ESR1 (0.48) HPGDALDH1A1HSD17B10
SCHEMBL915176 0.83 S1PR1 (0.54) ENPP2S1PR1S1PR3PLK1S1PR4
SCHEMBL915296 0.82 ENPP2 (0.51) ENPP2S1PR1S1PR3PLK1S1PR4
SCHEMBL914859 0.82 ENPP2 (0.51) ENPP2S1PR1S1PR3PLK1HPGD
SCHEMBL916015 0.81 ENPP2 (0.50) ENPP2S1PR1S1PR3PLK1S1PR4
SCHEMBL914626 0.81 EPHX2 (0.46) PTPN1ALDH1A1NPC1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed