SCHEMBL916015

SCHEMBL916015

CCCCc1ccc(S(=O)(=O)c2ccc(CP(=O)(O)OCC)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 1/20 0.50
CA2 P00918 3/20 0.49
SMN1; SMN2 Q16637 2/20 0.49
CA12 O43570 1/20 0.42
CA1 P00915 1/20 0.42
CA9 Q16790 1/20 0.42
S1PR1 P21453 6/20 0.41
S1PR3 Q99500 6/20 0.41
FDFT1 P37268 1/20 0.41
S1PR4 O95977 4/20 0.40
S1PR2 O95136 3/20 0.40
FFAR1 O14842 1/20 0.40
FFAR4 Q5NUL3 1/20 0.40
PLK1 P53350 1/20 0.40
ALDH1A1 P00352 2/20 0.40
HPGD P15428 2/20 0.40
HSD17B10 Q99714 1/20 0.40
LMNA P02545 1/20 0.39
TSHR P16473 1/20 0.39
HTT P42858 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914660 0.90 ENPP2 (0.60) ENPP2CA2CA1S1PR1S1PR3
SCHEMBL915728 0.85 ENPP2 (0.69) ENPP2CA2SMN1; SMN2CA12CA1
SCHEMBL917185 0.85 ENPP2 (0.55) ENPP2S1PR1S1PR3FDFT1S1PR4
SCHEMBL915295 0.85 ENPP2 (0.55) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL915303 0.84 GAA (0.46) ENPP2CA2CA12CA1CA9
SCHEMBL915176 0.83 S1PR1 (0.54) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL914859 0.82 ENPP2 (0.51) ENPP2S1PR1S1PR3PLK1ALDH1A1
SCHEMBL915296 0.82 ENPP2 (0.51) ENPP2CA2CA1S1PR1S1PR3
SCHEMBL915465 0.81 ENPP2 (0.50) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL915500 0.81 ALDH1A1 (0.44) CA2SMN1; SMN2CA12CA1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed