SCHEMBL915993

SCHEMBL915993

CCOP(=O)(O)Cc1ccc(C(C)(C)c2ccc(O)cc2)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 9/20 0.48
ESR2 Q92731 8/20 0.48
ESRRG P62508 4/20 0.48
CYP3A4 P08684 2/20 0.48
AR P10275 1/20 0.48
HPGD P15428 1/20 0.48
TSHR P16473 1/20 0.48
SLC6A2 P23975 1/20 0.48
SLC6A4 P31645 1/20 0.48
HTR6 P50406 1/20 0.48
SLC6A3 Q01959 1/20 0.48
HSD17B10 Q99714 1/20 0.48
ALDH1A1 P00352 1/20 0.43
ESRRB O95718 1/20 0.40
HDAC1 Q13547 1/20 0.39
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
KDM4E B2RXH2 1/20 0.38
PGK1 P00558 1/20 0.37
PGK2 P07205 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915441 0.89 PPARD (0.44) ESR1ESR2CYP3A4SLC6A2SLC6A4
SCHEMBL916542 0.88 ESR1 (0.48) ESR1ESR2ESRRGCYP3A4AR
Butane SCHEMBL27659367 0.85 POLB (0.41) ESR1ESR2CYP3A4TSHRSLC6A2
SCHEMBL915465 0.84 ENPP2 (0.50) HPGDHSD17B10ALDH1A1
SCHEMBL914626 0.84 EPHX2 (0.46) ALDH1A1HDAC1MEN1KMT2ALMNA
SCHEMBL7193887 0.84 EPHX2 (0.44) ESRRGHDAC1MEN1KMT2APGK1
Bisphenol A SCHEMBL29461417 0.84 ESR1 (0.55) ESR1ESR2ESRRGCYP3A4AR
SCHEMBL915108 0.84 HDAC1 (0.42) ESR1ESR2HDAC1POLB
SCHEMBL915285 0.84 PTPN1 (0.50) ESR1ESR2HDAC1MEN1KMT2A
SCHEMBL4452534 0.83 EPHX2 (0.40) ARHPGDTSHRALDH1A1HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed