SCHEMBL915296

SCHEMBL915296

CCCCc1ccc(Sc2ccc(CP(=O)(O)OCC)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ENPP2 Q13822 1/20 0.51
S1PR1 P21453 11/20 0.42
S1PR3 Q99500 11/20 0.42
S1PR4 O95977 8/20 0.41
S1PR2 O95136 8/20 0.41
PLK1 P53350 1/20 0.41
ALDH1A1 P00352 2/20 0.41
HPGD P15428 2/20 0.41
HSD17B10 Q99714 1/20 0.41
S1PR5 Q9H228 3/20 0.39
CA1 P00915 1/20 0.38
CA2 P00918 1/20 0.38
RARB P10826 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL914660 0.91 ENPP2 (0.60) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL915295 0.87 ENPP2 (0.55) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL917185 0.87 ENPP2 (0.55) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL916540 0.85 ENPP2 (0.71) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL915176 0.84 S1PR1 (0.54) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL915868 0.84 NR1H2 (0.44) ENPP2CA1CA2
SCHEMBL914859 0.83 ENPP2 (0.51) ENPP2S1PR1S1PR3PLK1ALDH1A1
SCHEMBL915465 0.82 ENPP2 (0.50) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL916015 0.82 ENPP2 (0.50) ENPP2S1PR1S1PR3S1PR4S1PR2
SCHEMBL28066733 0.80 ENPP2 (0.63) ENPP2S1PR1S1PR3S1PR4S1PR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed