SCHEMBL915532

SCHEMBL915532

CC(C)(c1ccc(O)cc1)c1ccc(CP(=O)(O)O)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 6/20 0.57
ESR2 Q92731 5/20 0.57
ESRRG P62508 4/20 0.57
CYP3A4 P08684 2/20 0.57
AR P10275 1/20 0.57
HPGD P15428 1/20 0.57
TSHR P16473 1/20 0.57
SLC6A2 P23975 1/20 0.57
SLC6A4 P31645 1/20 0.57
HTR6 P50406 1/20 0.57
SLC6A3 Q01959 1/20 0.57
HSD17B10 Q99714 1/20 0.57
PGK1 P00558 4/20 0.54
PGK2 P07205 4/20 0.54
ALDH1A1 P00352 1/20 0.50
ESRRB O95718 1/20 0.45
ENPP2 Q13822 1/20 0.45
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
LMNA P02545 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915744 0.84 PGK1 (0.57) ESR1ESR2PGK1PGK2ENPP2
Bisphenol A SCHEMBL29461347 0.83 ESR1 (0.64) ESR1ESR2ESRRGCYP3A4AR
Bisphenol A SCHEMBL11513498 0.83 GAA (0.52) ESR1ESR2ESRRGCYP3A4AR
Bisphenol A SCHEMBL29411202 0.82 ESR1 (0.76) ESR1ESR2ESRRGCYP3A4AR
Bisphenol A SCHEMBL9280917 0.82 ESR1 (0.76) ESR1ESR2ESRRGCYP3A4AR
SCHEMBL915993 0.82 ESR1 (0.48) ESR1ESR2ESRRGCYP3A4AR
SCHEMBL915820 0.81 EPHX2 (0.51) PGK1PGK2ALDH1A1ENPP2MEN1
SCHEMBL5037236 0.81 PGK1 (0.61) ESRRGPGK1PGK2ENPP2MEN1
Butane SCHEMBL27352790 0.81 ENPP2 (0.59) ESR1ESR2CYP3A4SLC6A2SLC6A4
SCHEMBL914858 0.80 ENPP2 (0.69) HPGDHSD17B10PGK1PGK2ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
CN-101208371-B Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI 2011-08-10 CN disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
CN-101263175-A Polyester, process for production of polyester, and polyester molded article TOYO BOSEKI (JP) 2008-09-10 CN disclosed
CN-101208371-A Method for preparing polyester and polyester manufactured by the method as well as polyester formed body TOYO BOSEKI (JP) 2008-06-25 CN disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed