SCHEMBL915108

SCHEMBL915108

CCOP(=O)(O)Cc1ccc(-c2ccc(O)cc2)cc1

nearest known ligand 0.42

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HDAC1 Q13547 1/20 0.42
POLB P06746 1/20 0.41
PPARD Q03181 1/20 0.40
PTPN1 P18031 1/20 0.39
ESR2 Q92731 3/20 0.38
ESR1 P03372 2/20 0.38
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
LTB4R2 Q9NPC1 1/20 0.37
HDAC2 Q92769 1/20 0.37
HDAC8 Q9BY41 1/20 0.37
ENPP2 Q13822 1/20 0.37
CETP P11597 3/20 0.36
HSD17B1 P14061 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915441 0.95 PPARD (0.44) HDAC1POLBPPARDPTPN1ESR2
Butane SCHEMBL27659367 0.91 POLB (0.41) HDAC1POLBPPARDPTPN1ESR2
SCHEMBL915285 0.90 PTPN1 (0.50) HDAC1POLBPPARDPTPN1ESR2
SCHEMBL17488978 0.87 PPARD (0.50) HDAC1POLBPPARDENPP2CETP
SCHEMBL914831 0.87 LTA4H (0.51) POLBPPARDPTPN1ESR2ESR1
SCHEMBL915623 0.86 ACP3 (0.45) HDAC1POLBCETP
SCHEMBL915420 0.86 EGFR (0.44) HDAC1POLBPPARDESR2ESR1
SCHEMBL914720 0.85 ESR1 (0.47) HDAC1POLBESR2ESR1CA12
SCHEMBL915868 0.85 NR1H2 (0.44) HDAC1POLBPPARDPTPN1ESR2
SCHEMBL915993 0.84 ESR1 (0.48) HDAC1POLBESR2ESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed