SCHEMBL915285

SCHEMBL915285

CCOP(=O)(O)Cc1ccc(Cc2ccc(O)cc2)cc1

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTPN1 P18031 1/20 0.50
ESR1 P03372 2/20 0.48
ESR2 Q92731 2/20 0.48
POLB P06746 1/20 0.41
PPARD Q03181 1/20 0.40
HDAC1 Q13547 1/20 0.37
CA12 O43570 1/20 0.37
CA1 P00915 1/20 0.37
CA2 P00918 1/20 0.37
CA7 P43166 1/20 0.37
CA9 Q16790 1/20 0.37
CA14 Q9ULX7 1/20 0.37
ENPP2 Q13822 1/20 0.37
CETP P11597 3/20 0.36
EGFR P00533 1/20 0.35
TMEM97 Q5BJF2 1/20 0.35
SIGMAR1 Q99720 1/20 0.35
KDM4E B2RXH2 1/20 0.35
MEN1 O00255 1/20 0.35
KMT2A Q03164 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL915441 0.95 PPARD (0.44) PTPN1ESR1ESR2POLBPPARD
Butane SCHEMBL27659367 0.91 POLB (0.41) PTPN1ESR1ESR2POLBPPARD
SCHEMBL915108 0.90 HDAC1 (0.42) PTPN1ESR1ESR2POLBPPARD
SCHEMBL17488978 0.87 PPARD (0.50) POLBPPARDHDAC1ENPP2CETP
SCHEMBL914831 0.87 LTA4H (0.51) PTPN1ESR1ESR2POLBPPARD
SCHEMBL915629 0.86 ESR1 (0.48) PTPN1ESR1ESR2POLBPPARD
SCHEMBL914720 0.85 ESR1 (0.47) ESR1ESR2POLBHDAC1CA12
SCHEMBL915868 0.85 NR1H2 (0.44) PTPN1ESR1ESR2POLBPPARD
SCHEMBL915993 0.84 ESR1 (0.48) ESR1ESR2POLBHDAC1KDM4E
SCHEMBL915303 0.84 GAA (0.46) PTPN1ESR1POLBPPARDHDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250298333-A1 POLYESTER RESIN COMPOSITION, ELECTROSTATIC CHARGE IMAGE DEVELOPING TONER, DEVELOPER, AND IMAGE FORMING METHOD Konica Minolta, Inc. (JP) 2025-09-25 US disclosed
US-7868126-B2 Process for producing polyester, polyester produced using said process, and polyester molded product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2011-01-11 US disclosed
EP-1842868-B1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT TOYO BOSEKI (JP) 2010-11-10 EP disclosed
US-20090082529-A1 Polyester, Process for Producing Polyester, and Polyester Molded Article TOYO BOSEKI KABUSHIKI KAISHA (JP) 2009-03-26 US disclosed
US-20080249280-A1 Process for Producing Polyester, Polyester Produced Using Said Process, and Polyester Molded Product TOYO BOSEKI KABUSHIKI KAISHA (JP) 2008-10-09 US disclosed
EP-1932867-A1 POLYESTER, PROCESS FOR PRODUCTION OF POLYESTER, AND POLYESTER MOLDED ARTICLE Toyo Boseki Kabushiki Kasisha (JP) 2008-06-18 EP disclosed
EP-1842868-A1 PROCESS FOR PRODUCING POLYESTER, POLYESTER PRODUCED USING SAID PROCESS, AND POLYESTER MOLDED PRODUCT Toyo Boseki Kabushiki Kasisha (JP) 2007-10-10 EP disclosed